01073nam a2200277 i 450099100306691970753620021031120611.0020318s1996 us ||| | eng 0471954772Lire 517.300b11749799-39ule_instLE02615120ExLDip.to Ingegneria dell'Innovazioneita621.38152Lavernia, J. Enrique530266Spray atomization and deposition /Enrique J. Lavernia and Yue WuNew York [etc] :J. Wiley,c 1996xii, 627 p. :ill. ;24 cmSemiconduttori - TecnologiaSpray atomizationWu, Yueauthorhttp://id.loc.gov/vocabulary/relators/aut735950.b1174979921-09-0605-11-02991003066919707536LE026 621.38152 LAV 01.01 199612026000011981le026pE0.00-l- 40000.i1198980405-11-02Spray atomization and deposition1454015UNISALENTOle02601-01-02ma -engus 01