01314nam a22002654i 450099100284348970753620070807081833.0070918s2007 fr ab b 000 0 fre 9782757200537b13588424-39ule_instDip.to Beni Arti e StoriaitaSchweizer, Francois.626469La Chãsse des enfants de Saint Sigismond de l'Abbaye de Saint-Maurice :un prestigieux reliquaire restaure /Francois Schweizer et Denise Witschard ; con il contributo di Remo Becci ... [et al.].Parigi :Somogy ;Sion :Fondation pour la restauration de deux chefs-d'oeuvre d'orfevrerie medievale en Valais,c2007.240 p. :ill. (alcune color.), tav. ;29 cm.Include bibliografia (p. 228-231).ReliquiariFranciaRestauroWitschard, Denise.authorhttp://id.loc.gov/vocabulary/relators/aut738779Becci, Remo.b1358842402-04-1418-09-07991002843489707536LE019 A34 AR F 2412019000049191le019-E60.00-l- 00000.i1455550518-09-07Chãsse des enfants de Saint Sigismond de l'Abbaye de Saint-Maurice1463463UNISALENTOle01918-09-07ma -frefr 3003915nam 2200889z- 450 991058593690332120220812(CKB)5600000000483113(oapen)https://directory.doabooks.org/handle/20.500.12854/91170(oapen)doab91170(EXLCZ)99560000000048311320202208d2022 |y 0engurmn|---annantxtrdacontentcrdamediacrrdacarrierNanoimprint Lithography Technology and ApplicationsBaselMDPI - Multidisciplinary Digital Publishing Institute20221 online resource (180 p.)3-0365-4482-8 3-0365-4481-X Nanoimprint Lithography (NIL) has been an interesting and growing field in recent years since its beginnings in the mid-1990s. During that time, nanoimprinting has undergone significant changes and developments and nowadays is a technology used in R&D labs and industrial production processes around the world. One of the exciting things about nanoimprinting process is its remarkable versatility and the broad range of applications. This reprint includes ten articles, which represent a small glimpse of the challenges and possibilities of this technology. Six contributions deal with nanoimprint processes aiming at specific applications, while the other four papers focus on more general aspects of nanoimprint processes or present novel materials. Several different types of nanoimprint processes are used: plate-to-plate, roll-to-plate, and roll-to-roll. Plate-to-plate NIL here also includes the use of soft and flexible stamps. The application fields in this reprint are broad and can be identified as plasmonics, superhydrophibicity, biomimetics, optics/datacom, and life sciences, showing the broad applicability of nanoimprinting. The sections on the nanoimprint process discuss filling and wetting aspects during nanoimprinting as well as materials for stamps and imprinting.Technology: general issuesbicsscangle of incidenceanisotropybiomimetic surfacebiomimeticsBlu-Ray patterningBragg SPPsclick chemistrycontact angledefect avoidancedurabilityel-T-NILel-UV-NILformulation developmentgratingguiding charthigh aspect ratio micro-structurehydrodynamic instabilitiesinorganic-organic hybrid polymerlarge-area patterningline and spacemastermorpho butterflyn/ananoimprint lithographynanoimprint lithography (NIL)negligible residual layerneuronal cell assayoleophobicoptical lossesoptical planar waveguidesorganic solar cellpartial cavity fillingplasmonspolymerR2R UV-NILreactive ion etchingroll-to-plate nanoimprint lithographyroll-to-plate R2P nanoimprintingSmartNILsuperhydrophobicsurface chemistryT-NILultraviolet nanoimprint lithographyundercut featuresUV-curable polymersUV-NILTechnology: general issuesMühlberger Michaeledt1328215Mühlberger MichaelothBOOK9910585936903321Nanoimprint Lithography Technology and Applications3038435UNINA