01266nam a2200325 i 450099100121010970753620020507112923.0960420s1989 us ||| | eng 1558990194b10188964-39ule_instLE00643966ExLDip.to Fisicaita53.853.9.1TK7871.85MRS462574Rapid thermal annealing-chemical vapor deposition and integrated processing :Symposium held April 25-28, 1989, San Diego CA /edited by David Hodul...[et al.]Pittsburgh :Materials Research Society,1989xi, 494 p. :ill. ;24 cm.MRS Symposium Proceedings ;146Semiconductor dopingCongressesSemiconductors-Heat treatmentCongressesVapor-platingCongressesHodul, David.b1018896417-02-1727-06-02991001210109707536LE006 53.9.1 HOD12006000056892le006-E0.00-l- 00000.i1023293x27-06-02Rapid thermal annealing-chemical vapor deposition and integrated processing190022UNISALENTOle00601-01-96ma -engus 01