01173nam a2200337 i 450099100103762970753620020507105449.0010228s1976 uk ||| | eng 0126969507b10164716-39ule_instLE00641087ExLDip.to Fisicaita53.7.1653.7.18530.4'1QC702.7Townsend, P.D.462579Ion implantation, sputtering and their applications /by P.D. Townsend, J.C. Kelly, N.E.W. HartleyLondon ; New York :Academic Press,1976ix, 333 p. :ill. ;24 cm.Includes bibliographies and index.Ion implantationSputtering (Physics)Kelly, John CliveHartley, N.E.W..b1016471621-09-0627-06-02991001037629707536LE006 53.7.18 TOW12006000058841le006-E0.00-l- 00000.i1020044727-06-02Ion implantation, sputtering and their applications188890UNISALENTOle00601-01-01ma -enguk 01