01694oam 2200493zu 450 99627965060331620210807004552.0(CKB)3460000000001286(SSID)ssj0001284244(PQKBManifestationID)12602267(PQKBTitleCode)TC0001284244(PQKBWorkID)11255938(PQKB)10681708(EXLCZ)99346000000000128620160829d2007 uy engtxtccrEMLC 2007 : 23rd European Mask and Lithography Conference : 22-25 January 2007, Grenoble, France[Place of publication not identified]SPIE2007Proceedings of SPIE EMLC 2007 Bibliographic Level Mode of Issuance: Monograph0-8194-6655-7 Integrated circuitsMasksCongressesMicrolithographyCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCIntegrated circuitsMasksMicrolithographyElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/31Maurer WilhelmWaelpoel JacquesBehringer Uwe F. WSociety of Photo Optical Instrumentation EngineersPQKBBOOK996279650603316EMLC 2007 : 23rd European Mask and Lithography Conference : 22-25 January 2007, Grenoble, France2877301UNISA