00949nam 2200325 450 99621597840331620180323154327.0(CKB)3460000000003686(WaSeSS)IndRDA00096287(NjHacI)993460000000003686(EXLCZ)99346000000000368620180323d2011 || |engur|||||||||||txtrdacontentcrdamediacrrdacarrierCMP Technology International Conference on Planarization : 25-27 October 2007Frankfurt am Main, Germany :VDE,2011.1 online resource (493 pages)3-8007-3065-0 Grinding and polishingCongressesGrinding and polishing621.92WaSeSSWaSeSSPROCEEDING996215978403316CMP Technology2528786UNISA