00926cam0-22003491i-450-99000398268040332120130221105642.088-15-09319-2000398268FED01000398268(Aleph)000398268FED0100039826820031126d2003----km-y0itay50------baitaITy-------001yy<<L'>>industria italianaMagda BiancoBolognaIl Mulino2003138 p.20 cmFarsi un'idea89IndustriaItalia1990-2003338.094521itaBianco,Magda83969ITUNINAREICATUNIMARCBK990003982680403321F/1.411 BIA/0320216SESSE120.03.01-5032DDECSESESDECSEIndustria italiana474297UNINA01965oam 2200529zu 450 99620656130331620210807003511.0(CKB)111055184271198(SSID)ssj0000455306(PQKBManifestationID)12203246(PQKBTitleCode)TC0000455306(PQKBWorkID)10399673(PQKB)10383448(EXLCZ)9911105518427119820160829d1996 uy engtxtccr1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society1996Bibliographic Level Mode of Issuance: Monograph0-9651577-0-9 Semiconductor wafersCongressesSemiconductorsCongressesEffect of radiation onPlasma radiationCongressesElectrical & Computer EngineeringHILCCElectrical EngineeringHILCCEngineering & Applied SciencesHILCCSemiconductor wafersCongressesSemiconductorsCongressesEffect of radiation onPlasma radiationCongressesElectrical & Computer EngineeringElectrical EngineeringEngineering & Applied Sciences621.3815/2Cheung Kin PGabriel Calvin TNakamura MoritakaIEEE Electron Devices SocietyAmerican Vacuum SocietyInternational Symposium on Plasma Process-Induced DamagePQKBBOOK9962065613033161996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA2527830UNISA