01939oam 2200529zu 450 99620656030331620210807003509.0(CKB)111055184271202(SSID)ssj0000395897(PQKBManifestationID)12119958(PQKBTitleCode)TC0000395897(PQKBWorkID)10473850(PQKB)11593881(EXLCZ)9911105518427120220160829d1998 uy engtxtccr1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society1998Bibliographic Level Mode of Issuance: Monograph0-9651577-2-5 Semiconductor wafersDefectsCongressesSemiconductorsEffect of radiation onCongressesPlasma etchingCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersDefectsSemiconductorsEffect of radiation onPlasma etchingElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Hook TerenceNakamura MoritakaDao Leanne Thuy LienAmerican Vacuum SocietyIEEE Electron Devices SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING9962065603033161998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA2522293UNISA