01841oam 2200517zu 450 99620248220331620210806235922.0(CKB)1000000000022072(SSID)ssj0000395896(PQKBManifestationID)12119957(PQKBTitleCode)TC0000395896(PQKBWorkID)10457104(PQKB)10834353(EXLCZ)99100000000002207220160829d2003 uy engtxtccr2003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France[Place of publication not identified]IEEE2003Bibliographic Level Mode of Issuance: Monograph0-7803-7747-8 Semiconductor wafersEffect of radiation onCongressesSemiconductorsCongressesPlasma radiationCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersEffect of radiation onSemiconductorsPlasma radiationElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Hook TerenceEriguchi KojiKrishnan SIEEE Electron Devices SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING9962024822033162003 8th International Symposium on Plasma- and Process-Induced Damage : April 24-25, 2003, Corbeil-Essonnes, France2507159UNISA