02000oam 2200517zu 450 99620210870331620210806235951.0(CKB)1000000000022313(SSID)ssj0000393517(PQKBManifestationID)12111400(PQKBTitleCode)TC0000393517(PQKBWorkID)10371792(PQKB)11674718(EXLCZ)99100000000002231320160829d2004 uy engtxtccr12th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004 : September 28-30, 2004, Hilton Portland & Executive Tower, Portland, OR[Place of publication not identified]IEEE2004Bibliographic Level Mode of Issuance: Monograph0-7803-8477-6 SemiconductorsHeat treatmentCongressesRapid thermal processingDefectsCongressesSemiconductor dopingCongressesSemiconductorsCongressesElectrical EngineeringHILCCElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCSemiconductorsHeat treatmentRapid thermal processingDefectsSemiconductor dopingSemiconductorsElectrical EngineeringElectrical & Computer EngineeringEngineering & Applied Sciences621.3815/2Gelpey Jeffrey CIEEE Electron Devices SocietyIEEE International Conference on Advanced Thermal Processing of SemiconductorsPQKBPROCEEDING99620210870331612th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004 : September 28-30, 2004, Hilton Portland & Executive Tower, Portland, OR2536943UNISA