01023nam--2200349---450-99000331381020331620090917112501.00-12-674780-6000331381USA01000331381(ALEPH)000331381USA0100033138120090917d1983----km-y0itay50------baengUS||||||||001yyVacuum technology, thin films and sputteringan introductionR. V. StuartOrlando [etc.]Academic Presscopyr. 1983VIII, 151 p.ill.23 cmtecnologia del vuotoFilm sottiliSpruzzamento catodico621.55STUART,R. V.605864ITsalbcISBD990003313810203316621.55 STU11301/CBS621.5500327663BKSCIRSIAV69020090917USA011125Vacuum technology, thin films and sputtering1120988UNISA