01265nam2-2200409---450-99000183719020331620040709103921.00-7503-0598-3000183719USA01000183719(ALEPH)000183719USA0100018371920040709d1999----km-y0itay0103----baengGBa|||||||001yy[Supplement] 99/1: Substrate preparation for thin film depositioneditors David A. Glocker, S. Ismat Shahguest editor L. VescanBristol ; PhiladelphiaIoPc19991 v. (paginazione varia)ill.31 cm.A fogli mobili200120010010001837032001Handbook of thin film process technologyFilm sottiliFisica530.4175GLOCKER,David A.SHAH,S. IsmatVESCAN,L.ITsalbcISBD990001837190203316530.4175 HAN (99/1)0029040/CBS530.417500113649530.4175 HAN (99/1 A)0029290/CBS530.417500113628BKSCIRIVELLI9020040709USA01103999949839UNISA