02148nam 2200625Ia 450 991100650750332120200520144314.01-282-00277-59786612002762(CKB)2420000000002774(OCoLC)646783016(CaPaEBR)ebrary10265735(SSID)ssj0000072233(PQKBManifestationID)11980106(PQKBTitleCode)TC0000072233(PQKBWorkID)10095367(PQKB)10677202(MiAaPQ)EBC3008693(BIP)46736062(BIP)7836715(EXLCZ)99242000000000277419890809d1990 uy 0engurcn|||||||||txtccrHandbook of plasma processing technology fundamentals, etching, deposition, and surface interactions /edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. WestwoodPark Ridge, N.J., U.S.A. Noyes Publicationsc19901 online resource (548 p.) Materials science and process technology seriesBibliographic Level Mode of Issuance: Monograph1-59124-297-5 0-8155-1764-5 0-8155-1220-1 Includes bibliographical references and index.This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.Materials science and process technology series.Plasma engineeringSemiconductorsEtchingPlasma etchingPlasma engineering.SemiconductorsEtching.Plasma etching.621.044Rossnagel Stephen M1823566Cuomo J. J1823567Westwood William D(William Dickson),1937-1823568MiAaPQMiAaPQMiAaPQBOOK9911006507503321Handbook of plasma processing technology4390296UNINA