03119nam 2200649 a 450 991100482950332120200520144314.01-61583-716-70-8194-8071-110.1117/3.613774(CKB)2470000000002951(EBL)728481(OCoLC)606630007(SSID)ssj0000381295(PQKBManifestationID)11258127(PQKBTitleCode)TC0000381295(PQKBWorkID)10381142(PQKB)11475716(MiAaPQ)EBC728481(CaBNVSL)gtp00538554(SPIE)9780819480712(PPN)237234149(EXLCZ)99247000000000295120050831d2006 uy 0engurbn||||m|||atxtccrEUV sources for lithography /[edited by] Vivek BakshiBellingham, Wash. SPIE Pressc20061 online resource (1094 p.)SPIE Press monograph ;PM149Description based upon print version of record.0-8194-5845-7 Includes bibliographical references and index.section 1. Introduction and technology review -- section 2. Fundamentals and modeling -- section 3. Plasma pinch soureces -- section 4. Laser-produced plasma (LPP) sources -- section 5. EUV source metrology -- section 6. Other types of EUV sources -- section 7. EUV source components.This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.SPIE Press monograph ;PM149.Ultraviolet radiationIndustrial applicationsExtreme ultraviolet lithographyPlasma (Ionized gases)LithographyUltraviolet radiationIndustrial applications.Extreme ultraviolet lithography.Plasma (Ionized gases)Lithography.621.36/4Bakshi Vivek1823797Society of Photo-optical Instrumentation Engineers.MiAaPQMiAaPQMiAaPQBOOK9911004829503321EUV sources for lithography4390751UNINA