02051oam 2200565zu 450 991087295890332120241212215203.0(CKB)111055184271208(SSID)ssj0000395894(PQKBManifestationID)12133636(PQKBTitleCode)TC0000395894(PQKBWorkID)10460988(PQKB)11193959(EXLCZ)9911105518427120820160829d2001 uy engtxtccr2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society2001Bibliographic Level Mode of Issuance: Monograph9780965157759 096515775X Semiconductor wafersEffect of radiation onCongressesSemiconductorsDefectsCongressesPlasma radiationCongressesSemiconductorsCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersEffect of radiation onSemiconductorsDefectsPlasma radiationSemiconductorsElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Engelhardt ManfredGabriel Calvin THook TerenceIEEE Electron Devices SocietyAmerican Vacuum SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING99108729589033212001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA2531197UNINA