01961oam 2200541zu 450 991087295790332120241212215208.0(CKB)111055184271206(SSID)ssj0000395899(PQKBManifestationID)12189669(PQKBTitleCode)TC0000395899(PQKBWorkID)10457105(PQKB)10532172(EXLCZ)9911105518427120620160829d2000 uy engtxtccr2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society2000Bibliographic Level Mode of Issuance: Monograph9780965157742 0965157741 Semiconductor wafersEffect of radiation onCongressesSemiconductorsCongressesPlasma radiationCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersEffect of radiation onSemiconductorsPlasma radiationElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Gabriel Calvin TEngelhardt ManfredKoyanagi MitsumasaIEEE Electron Devices SocietyAmerican Vacuum SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING99108729579033212000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA2515723UNINA