01951oam 2200541zu 450 991087295690332120241212215156.0(CKB)111055184271204(SSID)ssj0000395898(PQKBManifestationID)12171344(PQKBTitleCode)TC0000395898(PQKBWorkID)10460321(PQKB)10825066(EXLCZ)9911105518427120420160829d1999 uy engtxtccr1999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA[Place of publication not identified]Northern California Chapter of the American Vacuum Society1999Bibliographic Level Mode of Issuance: Monograph9780965157735 0965157733 Semiconductor wafersEffect of radiation onCongressesSemiconductorsCongressesPlasma radiationCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersEffect of radiation onSemiconductorsPlasma radiationElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Koyanagi MitsumasaDao Leanne Thuy LienHook TerenceIEEE Electron Devices SocietyAmerican Vacuum SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING99108729569033211999 4th International Symposium on Plasma Process-Induced Damage : May 9-11, 1999, Monterey, California, USA2522292UNINA