01881oam 2200541zu 450 991087293160332120241212215203.0(CKB)111055184271210(SSID)ssj0000395895(PQKBManifestationID)12103361(PQKBTitleCode)TC0000395895(PQKBWorkID)10460320(PQKB)10606869(EXLCZ)9911105518427121020160829d2002 uy engtxtccr2002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA[Place of publication not identified]AVS2002Bibliographic Level Mode of Issuance: Monograph9780965157773 0965157776 Semiconductor wafersEffect of radiation onCongressesSemiconductorsCongressesPlasma radiationCongressesElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCElectrical EngineeringHILCCSemiconductor wafersEffect of radiation onSemiconductorsPlasma radiationElectrical & Computer EngineeringEngineering & Applied SciencesElectrical Engineering621.3815/2Gabriel Calvin TEriguchi KojiHook TerenceIEEE Electron Devices SocietyAmerican Vacuum SocietyInternational Symposium on Plasma Process-Induced DamagePQKBPROCEEDING99108729316033212002 7th International Symposium on Plasma- and Process-Induced Damage : June 5-7, 2002, Maui, Hawaii, USA2501633UNINA