01153oam 2200385zu 450 991087280820332120241212215144.0(CKB)111055184256786(SSID)ssj0000451791(PQKBManifestationID)12174041(PQKBTitleCode)TC0000451791(PQKBWorkID)10463532(PQKB)10320433(EXLCZ)9911105518425678620160829d2002 uy engtxtccr2nd IEEE Conference on Nanotechnology 2002[Place of publication not identified]I E E E2002Bibliographic Level Mode of Issuance: Monograph9780780375383 0780375386 Engineering & Applied SciencesHILCCTechnology - GeneralHILCCEngineering & Applied SciencesTechnology - General620/.5IEEE, Northern Virginia Section StaffPQKBPROCEEDING99108728082033212nd IEEE Conference on Nanotechnology 20022546958UNINA02148nam 2200625Ia 450 991100650750332120200520144314.01-282-00277-59786612002762(CKB)2420000000002774(OCoLC)646783016(CaPaEBR)ebrary10265735(SSID)ssj0000072233(PQKBManifestationID)11980106(PQKBTitleCode)TC0000072233(PQKBWorkID)10095367(PQKB)10677202(MiAaPQ)EBC3008693(BIP)46736062(BIP)7836715(EXLCZ)99242000000000277419890809d1990 uy 0engurcn|||||||||txtccrHandbook of plasma processing technology fundamentals, etching, deposition, and surface interactions /edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. WestwoodPark Ridge, N.J., U.S.A. Noyes Publicationsc19901 online resource (548 p.) Materials science and process technology seriesBibliographic Level Mode of Issuance: Monograph1-59124-297-5 0-8155-1764-5 0-8155-1220-1 Includes bibliographical references and index.This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.Materials science and process technology series.Plasma engineeringSemiconductorsEtchingPlasma etchingPlasma engineering.SemiconductorsEtching.Plasma etching.621.044Rossnagel Stephen M1823566Cuomo J. J1823567Westwood William D(William Dickson),1937-1823568MiAaPQMiAaPQMiAaPQBOOK9911006507503321Handbook of plasma processing technology4390296UNINA