02017oam 2200529zu 450 991087255010332120241212215311.0(CKB)1000000000022313(SSID)ssj0000393517(PQKBManifestationID)12111400(PQKBTitleCode)TC0000393517(PQKBWorkID)10371792(PQKB)11674718(EXLCZ)99100000000002231320160829d2004 uy engtxtccr12th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004 : September 28-30, 2004, Hilton Portland & Executive Tower, Portland, OR[Place of publication not identified]IEEE2004Bibliographic Level Mode of Issuance: Monograph9780780384774 0780384776 SemiconductorsHeat treatmentCongressesRapid thermal processingDefectsCongressesSemiconductor dopingCongressesSemiconductorsCongressesElectrical EngineeringHILCCElectrical & Computer EngineeringHILCCEngineering & Applied SciencesHILCCSemiconductorsHeat treatmentRapid thermal processingDefectsSemiconductor dopingSemiconductorsElectrical EngineeringElectrical & Computer EngineeringEngineering & Applied Sciences621.3815/2Gelpey Jeffrey CIEEE Electron Devices SocietyIEEE International Conference on Advanced Thermal Processing of SemiconductorsPQKBPROCEEDING991087255010332112th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004 : September 28-30, 2004, Hilton Portland & Executive Tower, Portland, OR2536943UNINA