01334nam--2200421---450-99000034707020331620090326162432.00-674-29011-90034707USA010034707(ALEPH)000034707USA01003470720010228d1991----km-y0itay0103----baengGB||||||||001yyFacing Japanchinese politics and japanese imperialism, 1931Parks M. CobleHarvardCouncil on east asian studies, Harvard University1991XI, 492 p.24 cmHarvard East Asian monographs1352001Harvard East Asian monographs135CinaPoliticaCinaRelazioni internazionaliGiapponeRelazioni internazionali327.51052COBLE,Parks M.543113ITsalbcISBD990000347070203316327.51 COB 1 (ISP IV 823)24011 G.ISP IV00005381BKGIUTAMI4020010228USA011348TAMI4020010301USA01092220020403USA011642PATRY9020040406USA011624RSIAV49020090326USA011624Facing Japan878705UNISA02982nam 2200505 450 991083096680332120220901141105.01-119-88504-31-119-88506-X1-119-88505-1(MiAaPQ)EBC6837100(Au-PeEL)EBL6837100(CKB)20343300700041(OCoLC)1297840799(OCoLC)1294294282(OCoLC-P)1294294282(CaSebORM)9781786306708(EXLCZ)992034330070004120220901d2021 uy 0engurcnu||||||||txtrdacontentcrdamediacrrdacarrierRecording and voice processingVolume 1 history and generalities /Jean-Michel Réveillac1st edition.London ;Hoboken, NJ :ISTE Ltd :John Wiley and Sons Inc.,[2021]©20211 online resource (247 pages)Print version: Rveillac, Jean-Michel Recording and Voice Processing, Volume 1 Newark : John Wiley & Sons, Incorporated,c2022 9781786306708 Includes bibliographical references and index.Capturing, recording and broadcasting the voice is often difficult. Many factors must be taken into account and achieving a true representation is much more complex than one might think. The capture devices such as the position of the singer(s) or narrator(s), the acoustics, atmosphere and equipment are just some of the physical aspects that need to be mastered. Then there is the passage through the analog or digital channel, which disrupts the audio signal, as well as the processes that are often required to enrich, improve or even transform the vocal timbre and tessitura. While in the past these processes were purely material, today digital technologies and software produce surprising results that every professional in recording and broadcasting should know how to master. Recording and Voice Processing 1 addresses some general theoretical concepts. A history of recording and the physiology of the vocal apparatus are detailed in order to give the reader an understanding of the fundamental aspects of the subject. This volume also includes an advanced study of microphones, addressing their characteristics and typologies. The acoustic environment and its treatment are also considered in terms of the location of the sound capture - whether in a home studio, recording studio, live or natural environment - in order to achieve a satisfactory sound recording.VoiceSoundRecording and reproducingVoice.SoundRecording and reproducing.621.3893Reveillac Jean-Michel877405MiAaPQMiAaPQMiAaPQBOOK9910830966803321Recording and voice processing3933345UNINA03857nam 2201081z- 450 991059507690332120230220(CKB)5680000000080757(oapen)https://directory.doabooks.org/handle/20.500.12854/92043(oapen)doab97408(EXLCZ)99568000000008075720202209d2022 |y 0engurmn|---annantxtrdacontentcrdamediacrrdacarrierSilicon NanodevicesBaselMDPI - Multidisciplinary Digital Publishing Institute20221 online resource (238 p.)3-0365-4677-4 3-0365-4678-2 This book is a collection of scientific articles which brings research in Si nanodevices, device processing, and materials. The content is oriented to optoelectronics with a core in electronics and photonics. The issue of current technology developments in the nanodevices towards 3D integration and an emerging of the electronics and photonics as an ultimate goal in nanotechnology in the future is presented. The book contains a few review articles to update the knowledge in Si-based devices and followed by processing of advanced nano-scale transistors. Furthermore, material growth and manufacturing of several types of devices are presented. The subjects are carefully chosen to critically cover the scientific issues for scientists and doctoral students.Technology: general issuesbicsscanodeanti-phase boundaries (APBs)arsenatearseniteatomic layer etching (ALE)band-to-band tunnelingcharge-trap synaptic transistorCVDdark currentdetectorsdigital etchdoping effectdual-selective wet etchingepitaxial grownepitaxial growthFin etchingFinFETgermaniumGeSnGOIheteroepitaxyHfO2/Si0.7Ge0.3 gate stackHNO3 concentrationIII-V on Siin-plane nanowireinterface state densitylaserslithium-ion batterieslong-term potentiation (LTP)n/ananowire-based quantum devicesneural networkneuromorphic systemorganotrialkoxysilaneozone oxidationp+-Ge0.8Si0.2/Ge stackpassivationpattern recognitionphotodetectorsprussian blue nanoparticlesquantum computingquantum dotquasi-atomic-layer etching (q-ALE)responsivityselective epitaxial growth (SEG)selective wet etchingshort-term potentiation (STP)Si-capSi-MOSsilica beadssiliconsite-controlledspin qubitsstacked SiGe/Sithreading dislocation densities (TDDs)transistorsvertical gate-all-around (vGAA)vertical Gate-all-around (vGAA)water decontaminationyolk−shell structureTechnology: general issuesRadamson Henryedt1236601Wang GuileiedtRadamson HenryothWang GuileiothBOOK9910595076903321Silicon Nanodevices3033980UNINA