02595nam 2200577 a 450 991083031440332120170816123620.01-118-62170-01-118-62258-81-299-31558-51-118-62162-X(CKB)2560000000100639(EBL)1143631(SSID)ssj0000833715(PQKBManifestationID)11442668(PQKBTitleCode)TC0000833715(PQKBWorkID)10936315(PQKB)11753188(MiAaPQ)EBC1143631(OCoLC)830161625(CaSebORM)9781118621707(EXLCZ)99256000000010063920101203d2011 uy 0engur|n|---|||||txtccrNano-lithography[electronic resource] /edited by Stefan Landis1st editionLondon ISTE ;Hoboken, N.J. Wiley20111 online resource (353 p.)ISTE"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso.1-84821-211-9 Includes bibliographical references and index.Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,ISTENanolithographyNanolithography.621.381531Landis Stefan1619512Landis Stefan1619512MiAaPQMiAaPQMiAaPQBOOK9910830314403321Nano-lithography3951793UNINA