05229nam 2200625Ia 450 991083001050332120230617041823.01-280-52063-997866105206333-527-60558-43-527-60557-6(CKB)1000000000377553(EBL)481452(SSID)ssj0000222458(PQKBManifestationID)11215765(PQKBTitleCode)TC0000222458(PQKBWorkID)10168830(PQKB)11082164(MiAaPQ)EBC481452(OCoLC)85820654(EXLCZ)99100000000037755320040322d2005 uy 0engur|n|---|||||txtccrPlasma processes and polymers[electronic resource] /edited by Riccardo d'Agostino ... (et al)Weinheim ;[Chichester] Wiley-VCHc20051 online resource (548 p.)Description based upon print version of record.3-527-40487-2 Includes bibliographical references.Plasma Processes and Polymers; Contents; Preface; List of Contributors; Part I Plasma Deposition of Thin Films; 1 Polymer Surface Modification with Monofunctional Groups of Different Type and Density; 1.1 Introduction; 1.2 Experimental; 1.3 Results; 1.3.1 Kinetics of the Deposition of Copolymers; 1.3.2 Variation of the Density of Functional Groups; 1.3.3 Structure and Stability of Copolymers; 1.3.4 Relation between Functional Groups of Copolymers and Surface Energy; 1.3.5 Relation between Functional Groups of Copolymers and Adhesion; 1.4 Discussion2RF-Plasma Deposition of SiO(x) and a-C:H as Barrier Coatings on Polymers2.1 Introduction; 2.2 Experimental; 2.3 Results and Discussion; 2.4 Conclusions; 3 Upscaling of Plasma Processes for Carboxyl Functionalization; 3.1 Introduction; 3.2 Experimental; 3.2.1 Materials; 3.2.2 Plasma-Deposition Apparatus; 3.2.3 Characterization Techniques; 3.3 Results and Discussion; 3.4 Conclusions; 4 Deposition of Fluorocarbon Films on Al and SiO(2) Surfaces in High-Density Fluorocarbon Plasmas: Selectivity and Surface Wettability; 4.1 Introduction; 4.2 Experimental; 4.3 Results and Discussion4.3.1 Etching and Deposition in C(4)F(8) Plasmas4.3.2 Etching and Deposition Experiments in CHF(3)/CH(4) Plasmas; 4.3.3 FC Film Characterization: Chemical Composition; 4.4 Conclusions; 5 Hot-wire Plasma Deposition of Doped DLC Films on Fluorocarbon Polymers for Biomedical Applications; 5.1 Introduction; 5.2 Experimental Details; 5.2.1 Preparation of Samples; 5.2.2 Plasma Deposition Technique; 5.2.3 Surface Characterization; 5.2.4 Platelet-Adhesion Technique; 5.3 Results and Discussion; 5.3.1 Characterization of Deposited Film; 5.3.2 Platelet Adhesion6 Properties of Silicon Nitride by Room-Temperature Inductively Coupled Plasma Deposition6.1 Introduction; 6.2 Experimental Systems; 6.3 Results and Discussion; 6.4 Conclusions; 7 Structural Analysis of Diamond-like Carbon Films Deposited by RF (13.56 MHz) in a Methane Gas Plasma Atmosphere; 7.1 Introduction; 7.2 Experimental Procedure; 7.2.1 Deposition Apparatus; 7.2.2 Experimental Conditions; 7.3 Results and Discussions; 7.3.1 X-ray Auger Electron Spectroscopy (XAES); 7.3.2 Electron Energy Loss Spectroscopy (EELS); 7.4 Conclusion; 8 Rate constant of HMDSO + O reaction in plasma afterglow8.1 Introduction8.2 Experimental; 8.3 Calculation of the rate constant; 8.4 Results and discussion; 8.5 Conclusion; 9 Plasma-Enhanced Thin-Film Deposition On Polycarbonates; 9.1 Introduction; 9.2 Experimental; 9.3 Results; 9.4 Discussion; 9.5 Conclusions; 10 Molecular Tailoring Coating on TiO(2) Nanoparticle Surface by Plasma Polymerization; 10.1 Introduction; 10.2 Experimental; 10.3 Results and Discussions; 10.3.1 Surface Morphology; 10.3.2 Surface Molecular Structure; 10.3.3 Dispersion Behavior of AA-Plasma-Polymer-Coated TiO(2) Nanoparticles; 10.4 ConclusionPart II Plasma-Grafting of Functional GroupsThis volume compiles essential contributions to the most innovative fields of Plasma Processes and Polymers. High-quality contributions cover the fields of plasma deposition, plasma treatment of polymers and other organic compounds, plasma processes under partial vacuum and at atmospheric pressure, biomedical, textile, automotive, and optical applications as well as surface treatment of bulk materials, clusters, particles and powders. This unique collection of refereed papers is based on the best contributions presented at the 16th International Symposium on Plasma Chemistry in Taormina, IPlasma polymerizationCongressesPlasma chemistryCongressesPlasma polymerizationPlasma chemistry547/.28668.9D'Agostino Riccardo20435International Symposium on Plasma ChemistryMiAaPQMiAaPQMiAaPQBOOK9910830010503321Plasma processes and polymers4040225UNINA03765nam 22007455 450 991026109760332120251101110304.03-486-71808-810.1524/9783486718089(CKB)2550000001301292(EBL)1433472(OCoLC)879550800(SSID)ssj0001325550(PQKBManifestationID)11725807(PQKBTitleCode)TC0001325550(PQKBWorkID)11515397(PQKB)11599647(MiAaPQ)EBC1433472(DE-B1597)223481(OCoLC)979908431(DE-B1597)9783486718089(oapen)https://directory.doabooks.org/handle/20.500.12854/40577(oapen)doab40577(ODN)ODN0002483408(EXLCZ)99255000000130129220190708d2013 fg gerur|n|---|||||txtrdacontentcrdamediacrrdacarrierAkten zur Auswärtigen Politik der Bundesrepublik Deutschland Wissenschaftliche Leiterin: Ilse Dorothee Pautsch1979 /Michael Ploetz, Tim SzatkowskiBand 1:S. I- LXXXVIII, 1-950, Band 2: S. 951-2.128De Gruyter2010Berlin ;Boston :Oldenbourg Wissenschaftsverlag,[2013]©20101 online resource (2217 pages)Akten zur Auswärtigen Politik der Bundesrepublik Deutschland.Description based upon print version of record.3-486-59191-6 Includes bibliographical references and index.Frontmatter --Inhalt --Dokumentenverzeichnis --Akten zur Auswärtigen Politik der Bundesrepublik Deutschland 1979Herausgegeben im Auftrag des Auswärtigen Amts vom Institut für Zeitgeschichte. Hauptherausgeber: Horst Möller, Mitherausgeber: Klaus Hildebrand, Gregor Schöllgen Wissenschaftliche Leiterin: Ilse Dorothee Pautsch Das Jahr 1979 stand im Zeichen krisenhafter und den Weltfrieden bedrohender Entwicklungen: Im Februar übte China militärische Vergeltung für die Besetzung Kambodschas durch Vietnam. Die Revolution im Iran zwang den Schah ins Exil und ermöglichte die Rückkehr von Ayatollah Khomeini. Die Geiselnahme in der US-Botschaft in Teheran zeigte die Grenzen diplomatischer Bemühungen auf. Über die Umsetzung des Friedens von Camp David entbrannte im Nahen Osten eine heftige Kontroverse. Der sowjetische Einmarsch in Afghanistan am Jahresende belastete das Ost-West-Verhältnis. Auf dem Gebiet der Rüstungskontrolle wurde die Unterzeichnung des SALT-II-Vertrags begleitet von der weiteren Stationierung auf Westeuropa gerichteter sowjetischer Mittelstreckenraketen. Zusammen mit den USA warb Bonn für eine Strategie von Verhandlungen und Nachrüstung, die im NATO-Doppelbeschluss vom 12. Dezember ihren Ausdruck fand.PhilosophyHistory of PhilosophyAncient PhilosophyAußenpolitikBundesrepublik DeutschlandEditionZeitgeschichteGermany (West)Foreign relationsSourcesPhilosophyHistory of PhilosophyAncient Philosophy.Außenpolitik.Bundesrepublik Deutschland.Edition.Zeitgeschichte.658.405HIS000000HIS014000HIS037070bisacshPloetz Michael1853688Ploetz Michael1967-Szatkowski TimDE-B1597DE-B1597BOOK9910261097603321Akten zur Auswärtigen Politik der Bundesrepublik Deutschland4450299UNINA