04741nam 2200613 450 991079247430332120200520144314.01-84973-501-8(CKB)2660000000032597(EBL)1185602(SSID)ssj0001472189(PQKBManifestationID)11825275(PQKBTitleCode)TC0001472189(PQKBWorkID)11433080(PQKB)10913521(Au-PeEL)EBL1185602(CaPaEBR)ebr11004134(OCoLC)899941461(MiAaPQ)EBC1185602(PPN)198471440(EXLCZ)99266000000003259720150121h20152015 uy 0engurcnu||||||||txtccrShort wavelength laboratory sources principles and practices /edited by Davide Bieiner [and five others]Cambridge, England :Royal Society of Chemistry,2015.©20151 online resource (468 p.)Description based upon print version of record.1-84973-456-9 Includes bibliographical references at the end of each chapters and index.CONTENTS; ATOMIC AND PLASMA PHYSICS SOFTWARE AND DATABASES FOR THE SIMULATION OF SHORT WAVELENGTH SOURCES ; MODELLING OF PLASMA-BASED SEEDED SOFT X-RAY LASERS ; FIELD COHERENCE OF EUV SOURCES ; REACHABLE EXTREME ULTRAVIOLET WAVELENGTHS ACCORDING TO ELEMENTS/ATOMIC DATA ; ABSORPTION OF SHORT PUMPING PULSES FOR GRAZING INCIDENCE PUMPED X-RAY LASERS ; THEORETICAL ANALYSIS AND EXPERIMENTAL APPLICATIONS OF X-RAY WAVEGUIDES ; TABLE-TOP SOFT X-RAY Ar+8 LASERS EXCITED BY CAPILLARY Z-PINCHES ; NANOMETRE SCALE TAPERED PLANAR WAVEGUIDES FOR FOCUSING X-RAY FEMTOSECOND PULSESEXTREME ULTRAVIOLET EMISSION FROM MULTI-CHARGED STATE IONS IN POTASSIUM PLASMAS LASER PRODUCED PLASMA X-RAY AND EUV SOURCES FOR LITHOGRAPHY ; PRACTICAL ASPECTS OF XUV GENERATION BY NON-LINEAR FREQUENCY CONVERSION ; ELECTRON TRAJECTORIES IN HIGH HARMONIC GENERATION ; MODIFIED CATHODE TUBE: X-RAY AND XUV RADIATION FOR NANO-INSPECTION ; CHARACTERISTICS OF A SUB-PICOSECOND TITANIUM Kα SOURCE USING RELATIVISTICALLY INTENSE LASERS ; BREMSSTRAHLUNG X-RAY EMISSION IN ELECTRON-BEAM-PUMPED K8F LASERS ; THE BERN ADVANCED GLASS LASER FOR EXPERIMENT (BEAGLE) X-RAY LASER FACILITYENEA EXTREME ULTRAVIOLET LITHOGRAPHY MICRO-EXPOSURE TOOL: MAIN FEATURES CHARACTERISATION AND MITIGATION OF IONS AND PARTICULATE EMITTED BY SOURCES FOR EXTREME ULTRAVIOLET LITHOGRAPHY ; EUV MULTILAYER OPTICS: DESIGN, DEVELOPMENT AND METROLOGY ; APPLICATIONS OF KrF LASERS FOR GENERATING COHERENT EUV RADIATION ; BROADBAND MULTILAYERS: TAILOR MADE MIRRORS FOR LINEARLY POLARIZED X-RAYS FROM A LASER PLASMA SOURCE ; SHORT WAVELENGTH LABORATORY SOURCES FOR SEMICONDUCTOR INSPECTION AND FABRICATION ; CARBON-NANOTUBES FIELD EMITTER TO BE USED IN ADVANCED X-RAY SOURCELASER - PLASMA EUV SOURCE FOR MODIFICATION OF POLYMER SURFACES A SUB-PICO SECOND PLASMA SOURCE FOR TIME-RESOLVED X-RAY MEASUREMENTS ; APPLICATION OF FOCUSED X-RAY BEAMS IN RADIATION BIOLOGY; TIME-RESOLVED X-RAY DIFFRACTION OF CRYOGENIC SAMPLES USING A LASER BASED PLASMA SOURCE ; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE MEASUREMENTS USING A LABORATORY-SCALE XUV SOURCE ; NANOMETER SCALE IMAGING USING A DESK-TOP LASER PLASMA EUV SOURCE ; LASER-PLASMA EUV AND SOFT X-RAY SOURCES FOR MICROSCOPY APPLICATIONS ; NANOMETER SCALE IMAGING WITH TABLE-TOP EXTREME ULTRAVIOLET LASERDEVELOPMENT AND OPTIMIZATION OF LASER-PLASMA EXTREME ULTRAVIOLET AND SOFT X-RAY SOURCES FOR MICROSCOPY APPLICATIONS SUBJECT INDEXOur ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore routRadiation sourcesX-raysRadiation sources.X-rays.537Bieiner DavideRoyal Society of Chemistry (Great Britain)MiAaPQMiAaPQMiAaPQBOOK9910792474303321Short wavelength laboratory sources3816948UNINA