01487nam 2200457 450 991071349710332120200415103653.0(CKB)5470000002500678(OCoLC)1150884848(EXLCZ)99547000000250067820200415j202003 ua 0engur|||||||||||txtrdacontentcrdamediacrrdacarrierMicrowave photoelasticity a resonant wavelength approach applied to PEEK polymer /Peter J. Schemmel and Seth W. WaldsteinCleveland, Ohio :National Aeronautics and Space Administration, Glenn Research Center,March 2020.1 online resource (12 pages) color illustrationsNASA/TM ;2020-220499"March 2020."Includes bibliographical references (pages 11-12).Microwave photoelasticity PolymersnasatPEEKnasatNondestructive testsnasatPhotoelasticitynasatMaterials testsnasatPolymers.PEEK.Nondestructive tests.Photoelasticity.Materials tests.Schemmel Peter J.1401168NASA Glenn Research Center,GPOGPOBOOK9910713497103321Microwave photoelasticity3469508UNINA