01388aam 2200409I 450 991071023180332120160309011335.0GOVPUB-C13-65002c3fe1ac9d4dec590ec0663790d3(CKB)5470000002476971(OCoLC)944188026(EXLCZ)99547000000247697120160309d1980 ua 0engrdacontentrdamediardacarrierIn Situ oxidation of Y?O?-doped Si?N? /N. J. Tighe; K. Kuroda; T. E. Mitchell; A. H. HeuerGaithersburg, MD :U.S. Dept. of Commerce, National Institute of Standards and Technology,1980.1 online resourceNBSIR ;80-20751980.Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.Title from PDF title page.Includes bibliographical references.Tighe N. J1387899Heuer A. H1413175Kuroda K(Kazuaki)1413176Mitchell T. E1413177Tighe N. J1387899United States.National Bureau of Standards.NBSNBSGPOBOOK9910710231803321In Situ oxidation of Y?O?-doped Si?N3508913UNINA