01404aam 2200373I 450 991070956290332120240424200217.0GOVPUB-C13-e38651e9eb4e18ac5cc1a793902c1aff(CKB)5470000002479371(OCoLC)926748665(EXLCZ)99547000000247937120151026d1994 ua 0engrdacontentrdamediardacarrierStandard reference materials certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry /Brian G. RennexGaithersburg, MD :U.S. Dept. of Commerce, National Institute of Standards and Technology,1994.1 online resourceNIST special publication ;260-1211994.Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.Title from PDF title page.Includes bibliographical references.Standard reference materialsRennex Brian1388406National Institute of Standards and Technology (U.S.)NBSNBSGPOBOOK9910709562903321Standard reference materials3438961UNINA