01911oam 2200457I 450 991070860340332120180516150938.0(CKB)5470000002471197(OCoLC)1035764197(OCoLC)995470000002471197(EXLCZ)99547000000247119720180516d1990 ua 0engur|||||||||||txtrdacontentcrdamediacrrdacarrierA numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments /S.A. Gokoglu [and four others][Washington, D.C.] :National Aeronautics and Space Administration,[1990?]1 online resource (7 pages) illustrationsNASA/TM ;103631"Prepared for the 11th International Conference on Chemical Vapor Deposition (CVD-XI) sponsored by the Electrochemical Society Seattle, Washington, October 14-19, 1990."Includes bibliographical references (pages 4-5).Numerical and experimental analysis of reactor performance and deposition rates for chemical vapor deposition on monofilamentsNumerical analysisnasatChemical reactorsnasatComputational fluid dynamicsnasatAxisymmetric flownasatNumerical analysis.Chemical reactors.Computational fluid dynamics.Axisymmetric flow.Gokoglu Suleyman A(Suleyman Akif),1392913United States.National Aeronautics and Space Administration,GPOGPOGPOBOOK9910708603403321A numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments3498212UNINA