01547oam 2200457Ka 450 991069831680332120080402103022.0(CKB)4330000001973425(OCoLC)181656313(EXLCZ)99433000000197342520071120d2007 ua 0engurmn|||||||||txtrdacontentcrdamediacrrdacarrierSi passivation and chemical vapor deposition of silicon nitride[electronic resource] final technical report, March 18, 2007 /H.A. AtwaterGolden, Colo. :National Renewable Energy Laboratory,[2007]iv, 33 pages digital, PDF fileNREL/SR ;520-42325Title from title screen (viewed Mar. 20, 2008)."November 2007."Si Passivation and Chemical Vapor Deposition of Silicon Nitride Photovoltaic cellsResearchPolycrystalline semiconductorsResearchSiliconThin filmsPhotovoltaic cellsResearch.Polycrystalline semiconductorsResearch.Silicon.Thin films.Atwater H. A753411National Renewable Energy Laboratory (U.S.)SOESOESOEGPOBOOK9910698316803321Si passivation and chemical vapor deposition of silicon nitride3472207UNINA