04455nam 2200877z- 450 991055748740332120231214133212.0(CKB)5400000000042958(oapen)https://directory.doabooks.org/handle/20.500.12854/77002(EXLCZ)99540000000004295820202201d2021 |y 0engurmn|---annantxtrdacontentcrdamediacrrdacarrierNanoscale Self-Assembly: Nanopatterning and MetrologyBasel, SwitzerlandMDPI - Multidisciplinary Digital Publishing Institute20211 electronic resource (124 p.)3-0365-1961-0 3-0365-1960-2 The self-assembly process underlies a plethora of natural phenomena from the macro to the nano scale. Often, technological development has found great inspiration in the natural world, as evidenced by numerous fabrication techniques based on self-assembly (SA). One striking example is given by epitaxial growths, in which atoms represent the building blocks. In lithography, the use of self-assembling materials is considered an extremely promising patterning option to overcome the size scale limitations imposed by the conventional photolithographic methods. To this purpose, in the last two decades several supramolecular self-assembling materials have been investigated and successfully applied to create patterns at a nanometric scale. Although considerable progress has been made so far in the control of self-assembly processes applied to nanolithography, a number of unresolved problems related to the reproducibility and metrology of the self-assembled features are still open. Addressing these issues is mandatory in order to allow the widespread diffusion of SA materials for applications such as microelectronics, photonics, or biology. In this context, the aim of the present Special Issue is to gather original research papers and comprehensive reviews covering various aspects of the self-assembly processes applied to nanopatterning. Topics include the development of novel SA methods, the realization of nanometric structures and devices, and the improvement of their long-range order. Moreover, metrology issues related to the nanoscale characterization of self-assembled structures are addressed.Nanoscale Self-AssemblyTechnology: general issuesbicsscblock copolymer self-assemblyanalytical ultracentrifugationtannic acid3D printingnano-resolutionarbitrary distributionmultimaterialsdeposition surfacerapiditylarge scaleconjugated polymerspolyfullerenesprocessing by convective self-assemblythin films and microstructurephotoluminescence quenchingblock copolymersself-assemblypolymer interfacenanostructure metrologyline edge roughness LER(S)TEMSTEM-EELS of PS and PMMAdirected self-assemblynanospheres lithographycolloidal nanospheresdirect laser-writingdirected self-assembly (DSA)block copolymers (BCPs)chemo-epitaxypolystyrene-block-polymethylmethacrylate (PS-b-PMMA)line/space patterningline edge roughness (LER)line width roughness (LWR)sequential infiltration synthesisblock copolymernanoparticlescolloidal clusterscolloidal moleculessedimentationseparationclassification of nanoparticlesanalytical centrifugationdifferential centrifugal sedimentationdisk centrifugedensity gradient centrifugationTechnology: general issuesFerrarese Lupi Federicoedt1289232Ferrarese Lupi FedericoothBOOK9910557487403321Nanoscale Self-Assembly: Nanopatterning and Metrology3021118UNINA