04222nam 2201009z- 450 991055746570332120231214133203.0(CKB)5400000000043142(oapen)https://directory.doabooks.org/handle/20.500.12854/76375(EXLCZ)99540000000004314220202201d2021 |y 0engurmn|---annantxtrdacontentcrdamediacrrdacarrierCurrent Research in Thin Film DepositionApplications, Theory, Processing, and CharacterisationBasel, SwitzerlandMDPI - Multidisciplinary Digital Publishing Institute20211 electronic resource (154 p.)3-0365-0512-1 3-0365-0513-X Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.Current Research in Thin Film Deposition Technology: general issuesbicsscPECVDplasma diagnosticsnc-Si:HRF-PECVDFourier-transform infrared spectroscopy (FTIR)quadruple mass spectrometry (QMS)optical emission spectroscopy (OES)X-ray diffraction spectroscopy (XRD)micro hollow glass spheres (MHGS)solid micro glass spheres (SMGS)liquid phase deposition (LPD)aluminum coatingβ-Ga2O3MOCVDVI/III ratioscandium stabilized zirconia thin filmse-beam physical vapor depositionthin films ceramicsRaman spectroscopyX-ray diffractioninitiated chemical vapor deposition (iCVD)superhydrophobicfluoropolymerthin filmatomic layer depositionnanomechanicsYoung's modulusshear modulusresonant frequencyQ-factormicrocantileversinternal stressnickel-chromiumthin film thermocouplesphysical vapor depositionflat film extrusionfoil qualityMgF2color center absorptiondensitycrystal frequencystressadhesionpolarization controllingdual functional-metalensfocusingsplittingPVD coatingsnanoindentationbrittle crackingfracture toughnessdiamond coatingsresidual stressesinterfacial fatigue strengthannealingmillingTechnology: general issuesBirney Rossedt1309579Birney RossothBOOK9910557465703321Current Research in Thin Film Deposition3029413UNINA