04110nam 2200685Ia 450 991046285900332120200520144314.00-8014-6957-00-8014-6958-910.7591/9780801469589(CKB)2670000000417694(EBL)3138503(OCoLC)922998416(SSID)ssj0000950520(PQKBManifestationID)11520864(PQKBTitleCode)TC0000950520(PQKBWorkID)11005472(PQKB)10763817(StDuBDS)EDZ0001503924(MiAaPQ)EBC3138503(OCoLC)857069266(MdBmJHUP)muse28906(DE-B1597)478548(OCoLC)979627940(DE-B1597)9780801469589(Au-PeEL)EBL3138503(CaPaEBR)ebr10738661(CaONFJC)MIL683528(EXLCZ)99267000000041769420130104d2013 uy 0engur|n|---|||||txtccrNobody's business[electronic resource] twenty-first century avant-garde poetics /Brian M. ReedIthaca, NY Cornell University Press20131 online resource (248 p.)Description based upon print version of record.1-322-52246-4 0-8014-5157-4 Includes bibliographical references and index.Frontmatter -- Contents -- Preface: What Now? -- 1. In Praise of Obsolescence -- 2. New Consensus Poetics and the Avant-Garde -- 3. Mechanical Form and Avant-Garde Aesthetics -- 4. Flarf, Folly, and George W. Bush -- 5. Andrea Brady's Peculiar Dissidence -- 6. Danny Snelson's Disco Operating System -- Acknowledgments -- Notes -- IndexSince the turn of the new millennium English-language verse has entered a new historical phase, but explanations vary as to what has actually happened and why. What might constitute a viable avant-garde poetics in the aftermath of such momentous developments as 9/11, globalization, and the financial crisis? Much of this discussion has taken place in ephemeral venues such as blogs, e-zines, public lectures, and conferences. Nobody's Business is the first book to treat the emergence of Flarf and Conceptual Poetry in a serious way. In his engaging account, Brian M. Reed argues that these movements must be understood in relation to the proliferation of digital communications technologies and their integration into the corporate workplace.Writers such as Andrea Brady, Craig Dworkin, Kenneth Goldsmith, Danny Snelson, and Rachel Zolf specifically target for criticism the institutions, skill sets, and values that make possible the smooth functioning of a postindustrial, globalized economy. Authorship comes in for particular scrutiny: how does writing a poem differ in any meaningful way from other forms of "content providing"? While often adept at using new technologies, these writers nonetheless choose to explore anachronism, ineptitude, and error as aesthetic and political strategies. The results can appear derivative, tedious, or vulgar; they can also be stirring, compelling, and even sublime. As Reed sees it, this new generation of writers is carrying on the Duchampian practice of generating antiart that both challenges prevalent definitions or art and calls into question the legitimacy of the institutions that define it.American poetry21st centuryHistory and criticismExperimental poetry, AmericanHistory and criticismPoeticsHistory21st centuryElectronic books.American poetryHistory and criticism.Experimental poetry, AmericanHistory and criticism.PoeticsHistory811/.609Reed Brian M1050289MiAaPQMiAaPQMiAaPQBOOK9910462859003321Nobody's business2491220UNINA04799nam 2200637Ia 450 991046145640332120200520144314.01-61122-123-4(CKB)2670000000092425(EBL)3018148(SSID)ssj0000523915(PQKBManifestationID)11341041(PQKBTitleCode)TC0000523915(PQKBWorkID)10543273(PQKB)11409334(MiAaPQ)EBC3018148(Au-PeEL)EBL3018148(CaPaEBR)ebr10659070(OCoLC)923657261(EXLCZ)99267000000009242520100820d2011 uy 0engurcn|||||||||txtccrLithography[electronic resource] principles, processes and materials /Theodore C. Hennessy, editorNew York Nova Sciencec20111 online resource (299 p.)Engineering tools, techniques and tablesNanotechnology science and technologyDescription based upon print version of record.1-61761-837-3 Includes bibliographical references and index.""LITHOGRAPHY:PRINCIPLES, PROCESSES AND MATERIALS""; ""CONTENTS""; ""PREFACE""; ""PRINCIPLE, PROCESSES AND MATERIALS FOR NANO IMPRINT LITHOGRAPHY""; ""1. INTRODUCTION""; ""2. PRINCIPLE AND FUNDAMENTAL PROCESS FOR NIL""; ""2.1. Principle of NIL""; ""2.2. Theoretical Analysis for NIL""; ""2.3. Fundamental Process for NIL""; ""3. VARIATIONS OF NIL PROCESSES""; ""3.1. Combined Thermal and UV-NIL""; ""3.2. Reverse Imprint Process""; ""3.3. Laser-Assisted Direct Imprint""; ""3.4. Roll Imprint Process""; ""3.5. Substrate Conformal Imprint Lithography (SCIL)""; ""3.6. Large Area Imprint""""3.7. Nanoelectrode Lithography""""3.8. Hybrid NIL Process""; ""3.9. Metal Nanoparticle Nanoimprinting Process""; ""3.10. High Resolution NIL""; ""3.11. Other NIL Processes""; ""4. NIL MATERIALS""; ""4.1. NIL Resists""; ""4.2. Functional Materials and Other Imprintable Materials""; ""4.3. Mold Materials""; ""5. PROSPECTS AND CHALLENGES IN NIL""; ""6. CONCLUSION""; ""ACKNOWLEDGMENTS""; ""REFERENCES""; ""NANOFABRICATION IN ELECTRONBEAM LITHOGRAPHY""; ""1. ELECTRON BEAM LITHOGRAPHY OVERVIEW""; ""1.1. Introduction to the Electron Beam Lithography System""; ""1.2. Proximity Effect""""1.3. Numerical Calculation of the E-beam (Monte Carlo Method)""""2. CARBON NANOTUBE (CNT) BASED DEVICES""; ""2.1.Introduction to carbon nanotubes ""; ""2.2. VACNT Based FE Device with Individual Cathode Structures""; ""2.3. Field Emission Properties of Single Vertically Aligned Carbon Nanotubes""; ""2. VARIO""; ""2.4. Application in Micro CNT Column System""; ""3. FABRICATION OF 3D NANOSTRUCTURES ON CYLINDRICAL ROLLERS""; ""3.1. Introduction to Nanolithography""; ""3.2. In-House Field Emission Measurement Facility""; ""4. CONCLUSIONS""; ""ACKNOWLEDGMENT""; ""REFERENCES""""GENERATION OF MICRO PATTERNS ONSIDE SURFACES OF POLYMER AND SISUBSTRATES USING A MICROPUNCHING LITHOGRAPHY APPROACH""""ABSTRACT""; ""1. INTRODUCTION""; ""2. MACROPUNCHING METHOD AND MPL""; ""3. AU SIDEWALL PATTERNS ON HDPE CHANNELS""; ""3.1. Fabrication Procedure""; ""3.2. Experimental Results and Discussions""; ""4. SUPER HYDROPHOBIC PDMS CHANNELS""; ""4.1. Fabrication Process""; ""4.2. Experimental Results and Discussions""; ""5. FABRICATION OF AU DOTS ON SI SIDEWALLS""; ""5.1. Fabrication Procedures""; ""5.2. Results and Discussions""; ""6. SUMMARY AND CONCLUSIONS""; ""ACKNOWLEDGMENTS""""REFERENCES""""LITHOGRAPHY: PRINCIPLES,PROCESSES AND MATERIALS""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. PRINCIPLE OF LITHOGRAPHY""; ""3. PROCESSES OF LITHOGRAPHY""; ""3.1. RIE-NSL Lithography [32]""; ""3.2. FIB Lithography""; ""3.3. Laser Interference Lithography""; ""4. MATERIALS OF LITHOGRAPHY""; ""4.1. Materials of RIE-NSL Lithography""; ""4.2. Materials of FIB Lithography""; ""4.3. Materials of Laser Interference Lithography""; ""5. CONCLUSIONS""; ""REFERENCES""; ""LASER INTERFERENCE LITHOGRAPHY""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. THEORY""; ""3. INSTRUMENTATION""""3.1. Choice of Laser""Engineering tools, techniques and tables.Nanotechnology science and technology series.MicrolithographyMicrofabricationElectronic books.Microlithography.Microfabrication.621.3815/31Hennessy Theodore C890639MiAaPQMiAaPQMiAaPQBOOK9910461456403321Lithography1989487UNINA