01066nam0-2200313 --450 991032776020332120201104105637.0978880998622020190708d2019----kmuy0itay5050 baitaIT 001yyMMPI-2-RF®, DSM-5® e casi cliniciLaura Piccininiprefazione di Luigi Abbatecon i contributi di Laura Corbelli ... [et al.]FirenzeGiunti psychometrics2019XIII, 145 p.24 cm1 griglia per l'interpretazione, in tascaGuide clinicheMMPI-2-RF, DSM-5 e casi cliniciTest mentali per l'infanziaBambinivalutazioneimpiego [dei] test mentali155.4182823Piccinini,Laura765442Corbelli,Laura<1977- >ITUNINAREICATUNIMARCBK9910327760203321P.1 PCP 566BIBL. 2019FLFBCFLFBCMMPI-2-RF®, DSM-5® e casi clinici1555823UNINA02656oam 2200625I 450 991045587730332120200520144314.01-134-96162-61-134-96163-41-280-33039-20-203-06662-610.4324/9780203066621 (CKB)111087027071770(EBL)168205(OCoLC)264512766(SSID)ssj0000261704(PQKBManifestationID)11205081(PQKBTitleCode)TC0000261704(PQKBWorkID)10256935(PQKB)10809642ebr2004099(MiAaPQ)EBC168205(Au-PeEL)EBL168205(CaPaEBR)ebr10070708(CaONFJC)MIL33039(OCoLC)52487398(EXLCZ)9911108702707177020180331d1994 uy 0engur|n|---|||||txtccrTransnationals and governments recent policies in Japan, France, Germany, the United States, and Britain /David Bailey, George Harte, and Roger SugdenLondon ;New York :Routledge,1994.1 online resource (244 p.)Description based upon print version of record.0-415-09825-4 Includes bibliographical references and index.Book Cover; Title; Contents; List of figures, tables and matrices; Acknowledgements; INTRODUCTION: A SPECTRUM OF POLICY APPROACHES; JAPAN; FRANCE; GERMANY; UNITED STATES; BRITAIN; ISSUES OF CONCERN; IndexThe potential ease with which transnational corporations can relocate their activities gives them great leverage over individual governments. The authors outline the various policies that the world's major economies have adopted to cope with the unique issues created by transnationals. They reveal that there has been a marked contrast in the level of concern about transnationals' activities across the countries studied, and that this has resulted in significantly different approaches towards transnationals.International business enterprisesGovernment policyCase studiesElectronic books.International business enterprisesGovernment policy338.8/8Bailey David1966,956128Harte George1954-116183Sugden Roger116184MiAaPQMiAaPQMiAaPQBOOK9910455877303321Transnationals and governments2164347UNINA03897nam 2200661 a 450 991102043320332120200520144314.09786612346200978128234620812823462029780470017944047001794597804700654190470065419(CKB)1000000000357405(EBL)290997(OCoLC)476048340(SSID)ssj0000138763(PQKBManifestationID)11158392(PQKBTitleCode)TC0000138763(PQKBWorkID)10100704(PQKB)11779710(MiAaPQ)EBC290997(PPN)175354006(Perlego)2757716(EXLCZ)99100000000035740520060918d2007 uy 0engur|n|---|||||txtccrDielectric films for advanced microelectronics /edited by Mikhail Baklanov, Martin Green, and Karen MaexChichester, England ;Hoboken, NJ John Wiley & Sonsc20071 online resource (510 p.)Wiley series in materials for electronic and optoelectronic applicationsDescription based upon print version of record.9780470013601 0470013605 Includes bibliographical references and index.Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition /A. Grill --Spin-on dielectric materials /Geraud Dubois, Robert D. Miller, Willi Volksen --Positron annihilation spectroscopy /David W. Gidley, Hua-Gen Peng, Richard Vallery --Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation /Christopher L. Soles ... [et al.] --Ellipsometric porosimetry /Mikhail R. Baklanov --Mechanical and transport properties of low-k dielectrics /J. L. Plawsky ... [et al.] --Integration of low-k dielectric films in damascene processes /R. J. O. M. Hoofman ... [et al.] --ONO structures and oxynitrides in modern microelectronics : material science, characterization and application /Yakov Roizin, Vladimir Gritsenko --Material engineering of high-k gate dielectrics /Akira Toriumi, Koji Kita --Physical characterization of ultra-thin high-k dielectric /T. Conard, H. Bender, W. Vandervorst --Electrical characterization of advanced gate dielectrics /Robin Degraeve ... [et al.] --Integration issues of high-k gate dielectrics /Yasuo Nara --Anisotropic conductive film (ACF) for advanced microelectronic interconnects /Yi Li, C. P. Wong.The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments madWiley series in materials for electronic and optoelectronic applications.Dielectric filmsMicroelectronicsMaterialsDielectric films.MicroelectronicsMaterials.621.381Baklanov Mikhail1628643Green Martin151860Maex Karen1756502MiAaPQMiAaPQMiAaPQBOOK9911020433203321Dielectric films for advanced microelectronics4421630UNINA