03723nam 2200589Ia 450 991043780290332120200520144314.03-642-27381-510.1007/978-3-642-27381-0(CKB)2670000000279691(EBL)1106119(OCoLC)823722643(SSID)ssj0000798329(PQKBManifestationID)11442875(PQKBTitleCode)TC0000798329(PQKBWorkID)10739053(PQKB)10788302(DE-He213)978-3-642-27381-0(MiAaPQ)EBC1106119(PPN)168310600(EXLCZ)99267000000027969120121025d2012 uy 0engur|n|---|||||txtccrAuger- and x-ray photoelectron spectroscopy in materials science a user-oriented guide /Siegfried Hofmann1st ed. 2013.Berlin ;Heidelberg Springer20121 online resource (543 p.)Springer series in surface sciences ;49Description based upon print version of record.3-642-43173-9 3-642-27380-7 Includes bibliographical references and index.Outline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples).To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  .Springer Series in Surface Sciences,0931-5195 ;49X-ray photoelectron spectroscopyAuger effectX-ray photoelectron spectroscopy.Auger effect.543.62Hofmann S(Siegfried)1761717MiAaPQMiAaPQMiAaPQBOOK9910437802903321Auger- and x-ray photoelectron spectroscopy in materials science4201320UNINA