03967nam 22007935 450 991029973020332120200706031038.04-431-54795-910.1007/978-4-431-54795-2(CKB)2550000001199779(EBL)1698012(OCoLC)881166073(SSID)ssj0001178004(PQKBManifestationID)11623014(PQKBTitleCode)TC0001178004(PQKBWorkID)11168337(PQKB)10983249(MiAaPQ)EBC1698012(DE-He213)978-4-431-54795-2(PPN)176126422(EXLCZ)99255000000119977920140128d2014 u| 0engur|n|---|||||txtccrFeature Profile Evolution in Plasma Processing Using On-wafer Monitoring System /by Seiji Samukawa1st ed. 2014.Tokyo :Springer Japan :Imprint: Springer,2014.1 online resource (46 p.)SpringerBriefs in Applied Sciences and Technology,2191-530XDescription based upon print version of record.4-431-54794-0 Includes bibliographical references at the end of each chapters and index.Introduction -- On-wafer UV sensor and prediction of UV irradiation damage -- Prediction of Abnormal Etching Profiles in High-aspect-ratio Via/Hole Etching Using On-wafer Monitoring System -- Feature Profile Evolution in Plasma Processing Using Wireless On-wafer Monitoring System.This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.SpringerBriefs in Applied Sciences and Technology,2191-530XNanotechnologyNanoscale scienceNanoscienceNanostructuresPlasma (Ionized gases)SemiconductorsNanotechnology and Microengineeringhttps://scigraph.springernature.com/ontologies/product-market-codes/T18000Nanoscale Science and Technologyhttps://scigraph.springernature.com/ontologies/product-market-codes/P25140Nanotechnologyhttps://scigraph.springernature.com/ontologies/product-market-codes/Z14000Plasma Physicshttps://scigraph.springernature.com/ontologies/product-market-codes/P24040Semiconductorshttps://scigraph.springernature.com/ontologies/product-market-codes/P25150Nanotechnology.Nanoscale science.Nanoscience.Nanostructures.Plasma (Ionized gases).Semiconductors.Nanotechnology and Microengineering.Nanoscale Science and Technology.Nanotechnology.Plasma Physics.Semiconductors.621.044Samukawa Seijiauthttp://id.loc.gov/vocabulary/relators/aut993452MiAaPQMiAaPQMiAaPQBOOK9910299730203321Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System2274691UNINA