01771nam 2200469 450 991014571030332120230721004833.01-5090-7708-11-4244-1738-4(CKB)1000000000710998(SSID)ssj0000453329(PQKBManifestationID)12167337(PQKBTitleCode)TC0000453329(PQKBWorkID)10488788(PQKB)10890550(WaSeSS)IndRDA00123509(EXLCZ)99100000000071099820200522d2008 uy 0engur|||||||||||txtccrExtended Abstracts - 2008 8th International Workshop on Junction Technology 15-16 May 2008, Shanghai, China /Institute of Electrical and Electronics EngineersPiscataway, New Jersey :Institute of Electrical and Electronics Engineers,2008.1 online resource (77 pages)Bibliographic Level Mode of Issuance: Monograph1-4244-1737-6 SemiconductorsJunctionsCongressesSemiconductorsDesign and constructionCongressesIntegrated circuitsVery large scale integrationDesign and constructionCongressesSemiconductorsJunctionsSemiconductorsDesign and constructionIntegrated circuitsVery large scale integrationDesign and construction621.38152Institute of Electrical and Electronics Engineers,WaSeSSWaSeSSPROCEEDING9910145710303321Extended Abstracts - 2008 8th International Workshop on Junction Technology2502838UNINA