04655nam 2200649 450 991013502660332120200520144314.01-119-06918-11-119-06917-31-119-06922-X(CKB)4330000000008296(EBL)4661483(DLC) 2016025093(Au-PeEL)EBL4661483(CaPaEBR)ebr11252973(CaONFJC)MIL952650(OCoLC)950902105(CaSebORM)9781119069119(MiAaPQ)EBC4661483(PPN)267308876(EXLCZ)99433000000000829620160915h20162016 uy 0engur|n|---|||||rdacontentrdamediardacarrierFuture trends in microelectronics Journey into the unknown /edited by Serge Luryi, Jimmy Xu, Alexander ZaslavskyHoboken, New Jersey :IEEE Press :Wiley,2016.©20161 online resource (383 p.)Description based upon print version of record.1-119-06911-4 Includes bibliographical references at the end of each chapters and index.Cover ; Title Page ; Copyright ; Contents ; List of Contributors ; Preface ; Acknowledgments ; Part I Future of Digital Silicon; 1.1 Prospects of Future Si Technologies in the Data-Driven World; 1. Introduction ; 2. Memory - DRAM ; 3. Memory - NAND ; 4. Logic technology ; 5. CMOS image sensors ; 6. Packaging technology7. Silicon photonics technology 8. Concluding remarks ; Acknowledgments ; References ; 1.2 How Lithography Enables Moore's Law; 1. Introduction ; 2. Moore's Law and the contribution of lithography ; 3. Lithography technology: past and present ; 4. Lithography technology: future ; 5. Summary6. Conclusion Acknowledgments ; References ; 1.3 What Happened to Post-CMOS?; 1. Introduction ; 2. General constraints on speed and energy ; 3. Guidelines for success ; 4. Benchmarking and examples ; 5. Discussion ; 6. Conclusion ; Acknowledgments ; References1.4 Three-Dimensional Integration of Ge and Two-Dimensional Materials for One-Dimensional Devices1. Introduction ; 2. FEOL technology and materials for 3D integration ; 3. Integration of ""more than Moore"" functionality ; 4. Implications of 3D integration at the system level ; 5. Conclusion ; Acknowledgments ; References1.5 Challenges to Ultralow-Power Semiconductor Device Operation1. Introduction ; 2. Ultimate MOS transistors ; 3. Small slope switches ; 4. Conclusion ; Acknowledgments ; References ; 1.6 A Universal Nonvolatile Processing Environment; 1. Introduction ; 2. Universal nonvolatile processing environment3. Bias-field-free spin-torque oscillatorMicroelectronicsTechnological innovationsNanotechnologyTechnological innovationsSemiconductorsTechnological innovationsMicroelectronicsTechnological innovations.NanotechnologyTechnological innovations.SemiconductorsTechnological innovations.621.381Luryi SergeXu JimmyZaslavsky Alex1963-MiAaPQMiAaPQMiAaPQBOOK9910135026603321Future trends in microelectronics2279175UNINA