00821nam0-22002771i-450-990003870610403321000387061FED01000387061(Aleph)000387061FED0100038706119960715d--------km-y0itay50------baitaITModel Selection for Non-Linear Dynamic ModelsMassimiliano MarcellinoWorking Paper SeriesInnocenzo Gasparini Institute for Economic Research99.159EconometriaB/3.2Marcellino,Massimiliano<1970- >118775ITUNINARICAUNIMARCBK990003870610403321PaperSESSESModel Selection for Non-Linear Dynamic Models514264UNINAING0101457nam0 22003373i 450 CSA005775120220916072349.0IT71-1654 20210517d1970 ||||0itac50 baitaitz01i xxxe z01nFisica generaleJay Orear[1. ed. italiana sulla 2. ed. amer.]BolognaZanichelli©1970XV, 428 p.ill.25 cmTraduzione di Nella Tomasini Grimellini e Flavio Strada ; disegni di John Yue e di Herschel Wartik e Frank McCarthyFundamental physics.MIL0026838CFIV0122431538926FISICALibri di testoFIRNAPC018651IFISICA GENERALEFIRNAPC180071I530FISICA14530Fisica.17Orear, JayCFIV01224307046742ITIT-NA007920210517IT-BN0095 IT-AV0007 IT-BN0015 CSA0057751Biblioteca Centralizzata di Ateneo1 v. in due copie 01SALA 530 ORE fi(bis 0104 9000005485 B (bis 1 v. (2. copia)T 20120920201209201 v. 01SALA 530 ORE.fi 0104 9000001115 B 1 v.T 2007102520071025 01 AV PBFundamental physics1538926UNISANNIO02185nam0 22004573i 450 VAN018756820230613084600.440N978331966607520210719d2017 |0itac50 baengCH|||| |||||Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic TargetsDoctoral Thesis accepted by The Complutense University of Madrid, SpainMaría Ángela Pampillón ArceChamSpringer2017xxiii, 164 p.ill.24 cm001VAN01041932001 Springer thesesrecognizing outstanding Ph.D. research210 BerlinSpringer2010-VAN0187570Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets183020700A79 (77-XX)Physics [MSC 2020]VANC023182MF74K35Thin films [MSC 2020]VANC033952MF74A50Structured surfaces and interfaces, coexistent phases [MSC 2020]VANC036162MFGadolinium OxideKW:KGadolinium ScandateKW:KHigh Permittivity DielectricsKW:KHigh Pressure SputteringKW:KInP SubstratesKW:KMIS DevicesKW:KMOSFETKW:KPlasma OxidationKW:KScandium OxideKW:KScavenging EffectKW:KCHChamVANL001889Pampillón ArceMaría Á.VANV167264821841Springer <editore>VANV108073650ITSOL20240614RICAhttp://doi.org/10.1007/978-3-319-66607-5E-book – Accesso al full-text attraverso riconoscimento IP di Ateneo, proxy e/o ShibbolethBIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICAIT-CE0120VAN08NVAN0187568BIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA08CONS e-book 3139 08eMF3139 20210719 Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets1830207UNICAMPANIA