00906nam0 22002651i 450 RML028369420231121125731.0047107828X20121121d1980 ||||0itac50 baengusz01i xxxe z01nGlow Discharge Processessputtering and plasma etchingBrian ChapmanNew York Wiley 1980xvi, 406 p.23 cm.Chapman, BrianRMLV182969236695ITIT-0120121121IT-FR0099 Biblioteca Area IngegneristicaFR0099 RML0283694Biblioteca Area Ingegneristica 54DII 537.5 CHA 54VM 0000534555 VM barcode:BAIN004843. - Inventario:4621DVMA 2005022420121204 54Glow Discharge Processes3627020UNICAS