02264nam0 22005773i 450 VAN0028580520260616041257.889N9789819911417159147546520250129d2023 |0itac50 baengSG|||| |||||i e bcrPulsed Discharge PlasmasCharacteristics and ApplicationsTao Shao, Cheng Zhang editorsSingaporeSpringer2023xii, 1034 p.ill.24 cm001VAN001913012001 Springer Series in Plasma Science and Technology210 Cham [etc.]Springer70-XXMechanics of particles and systems [MSC 2020]VANC021390MF76XxxIonized gas flow in electromagnetic fields; plasmic flow [MSC 2020]VANC023330MF92ExxChemistry [MSC 2020]VANC025596MFChemical ReactionsKW:KDielectric Barrier DischargeKW:KDiffuse dischargeKW:KElectrical explosionKW:KEnergy ConversionKW:KFlow controlKW:KFluid modelKW:KGas dischargeKW:KHigh voltageKW:KNumerical SimulationKW:KOptical DiagnosticsKW:KPlasma biomedicineKW:KPlasma depositionKW:KPlasma jetKW:KPulse switchKW:KSurface ModificationKW:KSGSingaporeVANL000061ShaoTaoVANV239766340ZhangChengVANV239767340Springer <editore>VANV108073650ITSOL20260904RICAhttps://doi.org/10.1007/978-981-99-1141-7E-book – Accesso al full-text attraverso riconoscimento IP di Ateneo, proxy e/o ShibbolethBIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICAIT-CE0120VAN08NVAN00285805BIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA08DLOAD e-Book 10472 08eMF10472 20250212 Pulsed Discharge Plasmas4310587UNICAMPANIA