01846nam0 22004213i 450 VAN0028428420250313111736.320N978981196872320241218d2022 |0itac50 baengSG|||| |||||i e bStructure and Electronic Properties of Ultrathin In Films on Si(111)Doctoral Thesis accepted by Kyoto University, Kyoto, JapanShigemi TerakawaSingaporeSpringer2022xiv, 76 p.ill.24 cm001VAN001041932001 Springer thesesrecognizing outstanding Ph.D. research210 BerlinSpringer2010-00A79 (77-XX)Physics [MSC 2020]VANC023182MF74-XXMechanics of deformable solids [MSC 2020]VANC022466MF74K35Thin films [MSC 2020]VANC033952MF92ExxChemistry [MSC 2020]VANC025596MF2D MetalsKW:KARPESKW:KLEED and STMKW:KSurface StatesKW:KUltrathin FilmsKW:KSGSingaporeVANL000061TerakawaShigemiVANV2380801265780Springer <editore>VANV108073650ITSOL20250314RICAhttps://doi.org/10.1007/978-981-19-6872-3E-book – Accesso al full-text attraverso riconoscimento IP di Ateneo, proxy e/o ShibbolethBIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICAIT-CE0120VAN08NVAN00284284BIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA08DLOAD e-Book 10221 08eMF10221 20241220 Structure and Electronic Properties of Ultrathin in Films on Si(111)2968231UNICAMPANIA