01811nam0 22004213i 450 VAN0028412620250306102632.132N978981192900720241216d2022 |0itac50 baengSG|||| |||||i e bHigh-Density Helicon Plasma ScienceFrom Basics to ApplicationsShunjiro ShinoharaSingaporeSpringer2022xxi, 322 p.ill.24 cm001VAN001913012001 Springer Series in Plasma Science and Technology210 Cham [etc.]Springer76-XXFluid mechanics [MSC 2020]VANC019858MF82-XXStatistical mechanics, structure of matter [MSC 2020]VANC021931MFApplication to Plasma ThrusterKW:KHelicon Plasma SourceKW:KHelicon Wave Produced PlasmaKW:KHigh Density PlasmaKW:KIndustrial Application of Helicon Plasma SourceKW:KPlasma PropulsionKW:KRadio Frequency PlasmaKW:KSGSingaporeVANL000061ShinoharaShunjiroVANV2378831280685Springer <editore>VANV108073650ITSOL20250307RICAhttps://doi.org/10.1007/978-981-19-2900-7E-book – Accesso al full-text attraverso riconoscimento IP di Ateneo, proxy e/o ShibbolethBIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICAIT-CE0120VAN08NVAN00284126BIBLIOTECA DEL DIPARTIMENTO DI MATEMATICA E FISICA08DLOAD e-Book 10160 08eMF10160 20241220 High-Density Helicon Plasma Science3017395UNICAMPANIA