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1. |
Record Nr. |
UNINA9910452977203321 |
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Autore |
Storozhuk A. I͡U (Anna I͡Urʹevna) |
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Titolo |
Color [[electronic resource] ] : ontological status and epistemic role / / Anna Storozhuk |
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Pubbl/distr/stampa |
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New York., : Nova Science Publishers, 2010 |
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ISBN |
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Descrizione fisica |
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1 online resource (78 p.) |
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Collana |
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Chaos and complexity research compendium ; ; v. 1 |
Eye and vision research developments |
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Disciplina |
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Soggetti |
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Color (Philosophy) |
Color vision |
Electronic books. |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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The physical properties of color and its influence on the organism -- The source of the myths about experience : the principle of the being and thinking identity. |
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2. |
Record Nr. |
UNISA996216258403316 |
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Autore |
Bubert Henning |
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Titolo |
Surface and Thin Film Analysis : A Compendium of Principles, Instrumentation and Applications |
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Pubbl/distr/stampa |
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ISBN |
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1-280-55760-5 |
9786610557608 |
3-527-60016-7 |
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Edizione |
[2nd ed.] |
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Descrizione fisica |
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1 online resource (559 p.) |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Thin films - Analysis - Surfaces |
Electron spectroscopy |
Spectrum analysis |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di contenuto |
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Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications; Contents; Preface to the First Edition; Preface to the Second Edition; List of Contributors; 1: Introduction; Part One: Electron Detection; 2: X-Ray Photoelectron Spectroscopy (XPS); 2.1 Principles; 2.2 Instrumentation; 2.2.1 Vacuum Requirements; 2.2.2 X-Ray Sources; 2.2.3 Synchrotron Radiation; 2.2.4 Electron Energy Analyzers; 2.2.5 Spatial Resolution; 2.3 Spectral Information and Chemical Shifts; 2.4 Quantification, Depth Profiling, and Imaging; 2.4.1 Quantification; 2.4.2 Depth Profiling |
2.4.3 Imaging2.5 The A uger Parameter; 2.6 Applications; 2.6.1 Catalysis; 2.6.2 Polymers; 2.6.3 Corrosion and Passivation; 2.6.4 Adhesion; 2.6.5 Superconductors; 2.6.6 Semiconductors; 2.7 Ultraviolet Photoelectron Spectroscopy (UPS); References; 3: Auger Electron Spectroscopy (AES); 3.1 Principles; 3.2 Instrumentation; 3.2.1 Vacuum Requirements; 3.2.2 Electron Sources; 3.2.3 Electron-Energy Analyzers; 3.3 Spectral Information; 3.4 Quantification and Depth Profiling; 3.4.1 Quantification; 3.4.2 Depth Profiling; 3.5 Applications; 3.5.1 Grain Boundary Segregation; 3.5.2 Semiconductor Technology |
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3.5.3 Thin Films and Interfaces3.5.4 Surface Segregation; 3.6 Scanning A uger Microscopy (SAM); References; 4: Electron Energy-Loss Spectroscopy (EELS) and Energy-Filtering Transmission Electron Microscopy (EFTEM); 4.1 Principles; 4.2 Instrumentation; 4.3 Qualitative Spectral Information; 4.3.1 Low-Loss Excitations; 4.3.2 Ionization Losses; 4.3.3 Fine Structures; 4.4 Quantification; 4.5 Imaging of Element Distribution; 4.6 Summary; References; 5: Low-Energy Electron Diffraction (LEED); 5.1 Principles and History; 5.2 Instrumentation; 5.3 Qualitative Information; 5.3.1 LEED Pattern |
5.3.2 Spot Profile Analysis5.3.3 Applications and Restrictions; 5.4 Quantitative Structural Information; 5.4.1 Principles; 5.4.2 Experimental Techniques; 5.4.3 Computer Programs; 5.4.4 Applications and Restrictions; 5.5 Low-Energy Electron Microscopy; 5.5.1 Principles of Operation; 5.5.2 Applications and Restrictions; References; 6: Other Electron-Detecting Techniques; 6.1 Ion (Excited) Auger Electron Spectroscopy (IAES); 6.2 Ion Neutralization Spectroscopy (INS); 6.3 Inelastic Electron Tunneling Spectroscopy (IETS); Reference; Part Two: Ion Detection |
7: Static Secondary Ion Mass Spectrometry (SSIMS)7.1 Principles; 7.2 Instrumentation; 7.2.1 Ion Sources; 7.2.2 Mass Analyzers; 7.2.2.1 Quadrupole Mass Spectrometers; 7.2.2.2 Time-of-Flight Mass Spectrometry (TOF-MS); 7.3 Quantification; 7.4 Spectral Information; 7.5 Applications; 7.5.1 Oxide Films; 7.5.2 Interfaces; 7.5.3 Polymers; 7.5.4 Biosensors; 7.5.5 Surface Reactions; 7.5.6 Imaging; 7.5.7 Ultra-Shallow Depth Profiling; References; 8: Dynamic Secondary Ion Mass Spectrometry (SIMS); 8.1 Principles; 8.1.1 Compensation of Preferential Sputtering; 8.1.2 Atomic Mixing |
8.1.3 Implantation of Primary Ions |
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Sommario/riassunto |
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Surveying and comparing all techniques relevant for practical applications, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. Completely revised and updated, sections include electron, ion and photon detection, as well as scanning microscopy, while new chapters have been added to cover such recently developed techniques as SNOM, SERS, and laser ablation. Over 500 references and a list of equipment suppliers make this a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. |
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3. |
Record Nr. |
UNINA9910389744203321 |
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Titolo |
644-2019 - IEEE Standard Procedures for Measurement of Power Frequency Electric and Magnetic Fields from AC Power Lines / / IEEE |
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Pubbl/distr/stampa |
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New York. : , : IEEE, , 2020 |
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ISBN |
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Descrizione fisica |
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1 online resource (40 pages) |
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Disciplina |
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Soggetti |
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Electric fields - Measurement |
Magnetic fields - Measurement |
Electric lines - Standards |
Electric power transmission - Standards |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Sommario/riassunto |
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Uniform procedures for the measurement of power frequency electric and magnetic fields from alternating current (ac) overhead power lines and for the calibration of the meters used in these measurements are established in this standard. The procedures apply to the measurement of electric and magnetic fields close to ground level. The procedures can also be tentatively applied (with limitations, as specified in the standard) to electric fields near an energized conductor or structure. |
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4. |
Record Nr. |
UNIORUON00080075 |
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Autore |
IOANNES Pierius Valerianus |
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Titolo |
Ioannis Pierii Valeriani Bellunensis, hierogliphica, seu de sacris Aegyptiorum, aliarumque gentium literis commentarii : Summa cum industria exarati, & in libros quinquaginta octo redacti : quibus etiam duo alij ab eruditissimo viro sunt annexi : cum indice gemino |
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Pubbl/distr/stampa |
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Venetiis, : apud Io. Antonium, & Iacobum de Franciscis, 1604 |
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Descrizione fisica |
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Disciplina |
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Soggetti |
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SCRITTURA EGIZIANA ANTICA - Geroglifico - Interpretazione simbolica |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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