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Record Nr. |
UNISA996206560303316 |
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Titolo |
1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA |
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Pubbl/distr/stampa |
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[Place of publication not identified], : Northern California Chapter of the American Vacuum Society, 1998 |
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Disciplina |
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Soggetti |
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Semiconductor wafers - Defects |
Semiconductors - Effect of radiation on |
Plasma etching |
Electrical & Computer Engineering |
Engineering & Applied Sciences |
Electrical Engineering |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Bibliographic Level Mode of Issuance: Monograph |
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