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1. |
Record Nr. |
UNINA9910327760203321 |
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Autore |
Piccinini, Laura |
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Titolo |
MMPI-2-RF®, DSM-5® e casi clinici / Laura Piccinini ; prefazione di Luigi Abbate ; con i contributi di Laura Corbelli ... [et al.] |
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Pubbl/distr/stampa |
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Firenze, : Giunti psychometrics, 2019 |
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ISBN |
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Descrizione fisica |
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XIII, 145 p. ; 24 cm + 1 griglia per l'interpretazione, in tasca |
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Collana |
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Disciplina |
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Locazione |
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Collocazione |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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2. |
Record Nr. |
UNINA9911020433203321 |
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Titolo |
Dielectric films for advanced microelectronics / / edited by Mikhail Baklanov, Martin Green, and Karen Maex |
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Pubbl/distr/stampa |
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Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007 |
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ISBN |
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9786612346200 |
9781282346208 |
1282346202 |
9780470017944 |
0470017945 |
9780470065419 |
0470065419 |
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Descrizione fisica |
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1 online resource (510 p.) |
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Collana |
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Wiley series in materials for electronic and optoelectronic applications |
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Altri autori (Persone) |
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BaklanovMikhail |
GreenMartin |
MaexKaren |
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Disciplina |
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Soggetti |
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Dielectric films |
Microelectronics - Materials |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of |
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ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong. |
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Sommario/riassunto |
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The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments mad |
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