1.

Record Nr.

UNINA9910327760203321

Autore

Piccinini, Laura

Titolo

MMPI-2-RF®, DSM-5® e casi clinici / Laura Piccinini ; prefazione di Luigi Abbate ; con i contributi di Laura Corbelli ... [et al.]

Pubbl/distr/stampa

Firenze, : Giunti psychometrics, 2019

ISBN

9788809986220

Descrizione fisica

XIII, 145 p. ; 24 cm + 1 griglia per l'interpretazione, in tasca

Collana

Guide cliniche

Disciplina

155.41828

Locazione

FLFBC

Collocazione

P.1 PCP 566

Lingua di pubblicazione

Italiano

Formato

Materiale a stampa

Livello bibliografico

Monografia



2.

Record Nr.

UNINA9911020433203321

Titolo

Dielectric films for advanced microelectronics / / edited by Mikhail Baklanov, Martin Green, and Karen Maex

Pubbl/distr/stampa

Chichester, England ; ; Hoboken, NJ, : John Wiley & Sons, c2007

ISBN

9786612346200

9781282346208

1282346202

9780470017944

0470017945

9780470065419

0470065419

Descrizione fisica

1 online resource (510 p.)

Collana

Wiley series in materials for electronic and optoelectronic applications

Altri autori (Persone)

BaklanovMikhail

GreenMartin

MaexKaren

Disciplina

621.381

Soggetti

Dielectric films

Microelectronics - Materials

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

Description based upon print version of record.

Nota di bibliografia

Includes bibliographical references and index.

Nota di contenuto

Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill -- Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen -- Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery -- Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.] -- Ellipsometric porosimetry / Mikhail R. Baklanov -- Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.] -- Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.] -- ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko -- Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita -- Physical characterization of



ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst -- Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.] -- Integration issues of high-k gate dielectrics / Yasuo Nara -- Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong.

Sommario/riassunto

The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments mad