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1. |
Record Nr. |
UNISALENTO991002621969707536 |
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Titolo |
Government and opposition / London School of Economics and Political Science. - 1965- |
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ISSN |
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Altri autori (Enti) |
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London School of Economics and Political Scienceauthor |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Periodico |
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2. |
Record Nr. |
UNINA9910484115203321 |
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Autore |
Helliker Kirk |
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Titolo |
Fast Track Land Occupations in Zimbabwe : In the Context of the Zvimurenga / / by Kirk Helliker, Sandra Bhatasara, Manase Kudzai Chiweshe |
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Pubbl/distr/stampa |
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Cham : , : Springer International Publishing : , : Imprint : Springer, , 2021 |
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ISBN |
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Edizione |
[1st ed. 2021.] |
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Descrizione fisica |
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1 online resource (XI, 259 p. 1 illus.) |
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Disciplina |
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Soggetti |
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Geography |
Africa - Politics and government |
Identity politics |
Peace |
Social policy |
Regional Geography |
African Politics |
Politics and Gender |
Peace and Conflict Studies |
Social Policy |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Nota di contenuto |
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1. Zvimurenga Reflections -- 2. The First Chimurenga -- 3. Land Alienation, Land Struggles and the Rise of Nationalism in Rhodesia -- 4. The Second Chimurenga – Early Literature and Nationalists-Guerrillas -- 5. The Second Chimurenga – Guerrillas-Peasants, Spirituality and Patriarchy -- 6. Post-Independence Land Reform, War Veterans and Sporadic Rural Struggles -- 7. The Third Chimurenga – Party-State and War Veterans -- 8. The Third Chimurenga – Land Occupation Dynamics -- 9. Local Fast Track Occupations – The Cases of Shamva and Bindura -- 10. Conclusion. |
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Sommario/riassunto |
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This book offers the first detailed scholarly examination of the nation-wide land occupations which spread across the Zimbabwean countryside from the year 2000, and led to the state’s fast track land reform programme. In an innovative way, it highlights the decentralized character of the occupations by recognizing significant spatial variation around a number of key themes, including historical memory, modes of mobilization and gender. A case study of the land occupations in Mashonaland Central Province, based on original research, adds empirical weight to the argument. In further identifying and understanding the specificities and complexities of the land occupations, the book also frames them by way of a nuanced comparative-historical analysis of the three zvimurenga. It thus examines the land occupations (referred to, likely controversially, as the ‘third chimurenga’) with reference to the original anti-colonial revolt from the 1890s (the first chimurenga) and the war of liberation in the 1970s (the second chimurenga). Further, the book engages critically with the ruling party’s chimurenga narrative and the hegemonic understanding of the land occupations within Zimbabwean studies. This book is a crucial read for all scholars and students of post-2000 land and politics in Zimbabwe, but also for those more broadly interested in historical-comparative analyses of land struggles in Zimbabwe and beyond. . |
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3. |
Record Nr. |
UNINA9911019536103321 |
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Autore |
Bubert Henning |
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Titolo |
Surface and Thin Film Analysis : A Compendium of Principles, Instrumentation and Applications |
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Pubbl/distr/stampa |
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ISBN |
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1-280-55760-5 |
9786610557608 |
3-527-60016-7 |
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Edizione |
[2nd ed.] |
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Descrizione fisica |
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1 online resource (559 p.) |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Thin films - Analysis - Surfaces |
Electron spectroscopy |
Spectrum analysis |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di contenuto |
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Surface and Thin Film Analysis: A Compendium of Principles, Instrumentation, and Applications; Contents; Preface to the First Edition; Preface to the Second Edition; List of Contributors; 1: Introduction; Part One: Electron Detection; 2: X-Ray Photoelectron Spectroscopy (XPS); 2.1 Principles; 2.2 Instrumentation; 2.2.1 Vacuum Requirements; 2.2.2 X-Ray Sources; 2.2.3 Synchrotron Radiation; 2.2.4 Electron Energy Analyzers; 2.2.5 Spatial Resolution; 2.3 Spectral Information and Chemical Shifts; 2.4 Quantification, Depth Profiling, and Imaging; 2.4.1 Quantification; 2.4.2 Depth Profiling |
2.4.3 Imaging2.5 The A uger Parameter; 2.6 Applications; 2.6.1 Catalysis; 2.6.2 Polymers; 2.6.3 Corrosion and Passivation; 2.6.4 Adhesion; 2.6.5 Superconductors; 2.6.6 Semiconductors; 2.7 Ultraviolet Photoelectron Spectroscopy (UPS); References; 3: Auger Electron Spectroscopy (AES); 3.1 Principles; 3.2 Instrumentation; 3.2.1 Vacuum Requirements; 3.2.2 Electron Sources; 3.2.3 Electron-Energy Analyzers; 3.3 Spectral Information; 3.4 Quantification and Depth Profiling; 3.4.1 Quantification; 3.4.2 Depth Profiling; 3.5 Applications; 3.5.1 Grain Boundary Segregation; 3.5.2 Semiconductor Technology |
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3.5.3 Thin Films and Interfaces3.5.4 Surface Segregation; 3.6 Scanning A uger Microscopy (SAM); References; 4: Electron Energy-Loss Spectroscopy (EELS) and Energy-Filtering Transmission Electron Microscopy (EFTEM); 4.1 Principles; 4.2 Instrumentation; 4.3 Qualitative Spectral Information; 4.3.1 Low-Loss Excitations; 4.3.2 Ionization Losses; 4.3.3 Fine Structures; 4.4 Quantification; 4.5 Imaging of Element Distribution; 4.6 Summary; References; 5: Low-Energy Electron Diffraction (LEED); 5.1 Principles and History; 5.2 Instrumentation; 5.3 Qualitative Information; 5.3.1 LEED Pattern |
5.3.2 Spot Profile Analysis5.3.3 Applications and Restrictions; 5.4 Quantitative Structural Information; 5.4.1 Principles; 5.4.2 Experimental Techniques; 5.4.3 Computer Programs; 5.4.4 Applications and Restrictions; 5.5 Low-Energy Electron Microscopy; 5.5.1 Principles of Operation; 5.5.2 Applications and Restrictions; References; 6: Other Electron-Detecting Techniques; 6.1 Ion (Excited) Auger Electron Spectroscopy (IAES); 6.2 Ion Neutralization Spectroscopy (INS); 6.3 Inelastic Electron Tunneling Spectroscopy (IETS); Reference; Part Two: Ion Detection |
7: Static Secondary Ion Mass Spectrometry (SSIMS)7.1 Principles; 7.2 Instrumentation; 7.2.1 Ion Sources; 7.2.2 Mass Analyzers; 7.2.2.1 Quadrupole Mass Spectrometers; 7.2.2.2 Time-of-Flight Mass Spectrometry (TOF-MS); 7.3 Quantification; 7.4 Spectral Information; 7.5 Applications; 7.5.1 Oxide Films; 7.5.2 Interfaces; 7.5.3 Polymers; 7.5.4 Biosensors; 7.5.5 Surface Reactions; 7.5.6 Imaging; 7.5.7 Ultra-Shallow Depth Profiling; References; 8: Dynamic Secondary Ion Mass Spectrometry (SIMS); 8.1 Principles; 8.1.1 Compensation of Preferential Sputtering; 8.1.2 Atomic Mixing |
8.1.3 Implantation of Primary Ions |
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Sommario/riassunto |
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Surveying and comparing all techniques relevant for practical applications, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. Completely revised and updated, sections include electron, ion and photon detection, as well as scanning microscopy, while new chapters have been added to cover such recently developed techniques as SNOM, SERS, and laser ablation. Over 500 references and a list of equipment suppliers make this a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. |
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