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Record Nr. |
UNINA9911006507503321 |
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Titolo |
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood |
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Pubbl/distr/stampa |
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Park Ridge, N.J., U.S.A., : Noyes Publications, c1990 |
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ISBN |
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1-282-00277-5 |
9786612002762 |
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Descrizione fisica |
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1 online resource (548 p.) |
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Collana |
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Materials science and process technology series |
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Altri autori (Persone) |
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RossnagelStephen M |
CuomoJ. J |
WestwoodWilliam D <1937-> (William Dickson) |
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Disciplina |
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Soggetti |
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Plasma engineering |
Semiconductors - Etching |
Plasma etching |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Bibliographic Level Mode of Issuance: Monograph |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Sommario/riassunto |
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This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors. |
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