| |
|
|
|
|
|
|
|
|
1. |
Record Nr. |
UNINA9910458383403321 |
|
|
Titolo |
Arthritis and allied conditions : a textbook of rheumatology / / edited by William J. Koopman, Larry W. Moreland ; Danette Somers, acquisition editor ; Nancy Lazar, managing editor ; Patricia Gast, cover designer |
|
|
|
|
|
|
|
Pubbl/distr/stampa |
|
|
Philadelphia, Pennsylvania : , : Lippincott Williams & Wilkins, , 2005 |
|
©2005 |
|
|
|
|
|
|
|
|
|
ISBN |
|
|
|
|
|
|
Edizione |
[Fifteenth edition.] |
|
|
|
|
|
Descrizione fisica |
|
1 online resource (2831 pages) : illustrations (some color) |
|
|
|
|
|
|
Disciplina |
|
|
|
|
|
|
Soggetti |
|
Arthritis |
Rheumatism |
Electronic books. |
|
|
|
|
|
|
|
|
Lingua di pubblicazione |
|
|
|
|
|
|
Formato |
Materiale a stampa |
|
|
|
|
|
Livello bibliografico |
Monografia |
|
|
|
|
|
Note generali |
|
|
|
|
|
|
|
|
|
|
|
|
|
2. |
Record Nr. |
UNINA9910830622303321 |
|
|
Autore |
Oks E. M |
|
|
Titolo |
Plasma cathode electron sources [[electronic resource] ] : physics, technology, applications / / Efim Oks |
|
|
|
|
|
|
|
Pubbl/distr/stampa |
|
|
Weinheim, : Wiley-VCH, 2006 |
|
|
|
|
|
|
|
ISBN |
|
1-280-92154-4 |
9786610921546 |
3-527-60941-5 |
3-527-60924-5 |
|
|
|
|
|
|
|
|
Descrizione fisica |
|
1 online resource (183 p.) |
|
|
|
|
|
|
Disciplina |
|
|
|
|
|
|
Soggetti |
|
Plasma (Ionized gases) |
Ionized gases |
|
|
|
|
|
|
|
|
Lingua di pubblicazione |
|
|
|
|
|
|
Formato |
Materiale a stampa |
|
|
|
|
|
Livello bibliografico |
Monografia |
|
|
|
|
|
Note generali |
|
Description based upon print version of record. |
|
|
|
|
|
|
Nota di bibliografia |
|
Includes bibliographical references and index. |
|
|
|
|
|
|
Nota di contenuto |
|
Plasma Cathode Electron Sources; Contents; Preface; 1 Low-Pressure Discharges for Plasma Electron Sources; 1.1 Hollow-Cathode Discharge; 1.2 Discharges in Crossed Electric and Magnetic Fields; 1.3 Arc Discharges; 1.3.1 Vacuum-Arc Discharge; 1.3.2 Constricted Low-Pressure Arc Discharge; References; 2 Electron Emission from Plasma; 2.1 General Features of Electron Emission from Plasma; 2.1.1 Ion Extraction from Plasma; 2.1.2 Processes Associated with Electron Extraction from Plasma; 2.2 Control of Plasma Electron Emission Current; 2.2.1 Control of Steady-State Electron Current |
2.2.2 Control of Electron Emission in Pulsed Mode2.3 Emission Characteristics of the Plasma of a Constricted Arc Discharge with an Extended Anode Section; 2.4 Electron Emission from Plasma at Fore-Vacuum Pressures; 2.5 Special Features of Electron Emission from Nonstationary Plasma; References; 3 Plasma Sources for Axially Symmetric Electron Beams; 3.1 Cylindrical Electron-Beam Sources Based on Hollow-Cathode Discharges; 3.2 Sources of Steady-State Focused Electron Beams; 3.3 Sources of Tubular Electron Beams; References; 4 Generation of Large-Cross-Section Beams in Plasma-Cathode Systems |
|
|
|
|
|
|
|
|
|
|
|
4.1 Electron Sources with High Pulsed Energy Density4.2 Plasma Cathode Accelerators and Electron Sources with Microsecond Low-Pressure Arc Discharge; 4.3 Sub-Microsecond Pulsed Electron-Beam Sources; 4.4 Plasma-Cathode Large-Cross-Section Electron Sources Based on Hollow-Cathode Glow; 4.5 Pulsed Low-Energy Electron Sources; 4.6 Plasma-Cathode Electron Source for Ribbon Beam Production in the Fore-Vacuum Pressure Range; 4.6.1 Design of the Electron Source; 4.6.2 Characteristics of the Electron Source; 4.6.3 Parameters of the Plasma Sheet Generated by a Ribbon Electron Beam; References |
5 Some Applications of Plasma-Cathode Electron Sources5.1 Electron-Beam Welding; 5.2 Electron-Beam Cladding of Wear-Resistant Materials; 5.3 Use of Low-Energy, High-Current Electron Beams for Surface Treatment; 5.4 Production of Carbon Coatings by Plasma Produced by a Ribbon Electron Beam at Fore-Vacuum Pressure; References; Conclusion; Subject Index |
|
|
|
|
|
|
Sommario/riassunto |
|
This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications. |
|
|
|
|
|
|
|
| |