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Record Nr. |
UNINA9910830446403321 |
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Autore |
Rogers John A |
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Titolo |
Unconventional nanopatterning techniques and applications [[electronic resource] /] / John A. Rogers, Hong H. Lee |
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Pubbl/distr/stampa |
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Hoboken, N.J., : Wiley, c2009 |
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ISBN |
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1-281-93858-0 |
9786611938581 |
0-470-40578-3 |
0-470-40577-5 |
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Descrizione fisica |
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1 online resource (616 p.) |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Nanoparticles |
Nanostructured materials |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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UNCONVENTIONAL NANOPATTERNING TECHNIQUES AND APPLICATIONS; CONTENTS; PREFACE; I NANOPATTERNING TECHNIQUES; 1 INTRODUCTION; 2 MATERIALS; 2.1 Introduction; 2.2 Mold Materials and Mold Preparation; 2.2.1 Soft Molds; 2.2.2 Hard Molds; 2.2.3 Rigiflex Molds; 2.3 Surface Treatment and Modification; References; 3 PATTERNING BASED ON NATURAL FORCE; 3.1 Introduction; 3.2 Capillary Force; 3.2.1 Open-Ended Capillary; 3.2.2 Closed Permeable Capillary; 3.2.3 Completely Closed Capillary; 3.2.4 Fast Patterning; 3.2.5 Capillary Kinetics; 3.3 London Force and Liquid Filament Stability |
3.3.1 Patterning by Selective Dewetting3.3.2 Liquid Filament Stability: Filling and Patterning; 3.4 Mechanical Stress: Patterning of A Metal Surface; References; 4 PATTERNING BASED ON WORK OF ADHESION; 4.1 Introduction; 4.2 Work of Adhesion; 4.3 Kinetic Effects; 4.4 Transfer Patterning; 4.5 Subtractive Transfer Patterning; 4.6 Transfer Printing; References; 5 PATTERNING BASED ON LIGHT: OPTICAL SOFT LITHOGRAPHY; 5.1 Introduction; 5.2 System Elements; 5.2.1 Overview; 5.2.2 Elastomeric Photomasks; 5.2.3 Photosensitive Materials; 5.3 Two-Dimensional Optical Soft Lithography (OSL) |
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5.3.1 Two-Dimensional OSL with Phase Masks5.3.2 Two-Dimensional OSL with Embossed Masks; 5.3.3 Two-Dimensional OSL with Amplitude Masks; 5.3.4 Two-Dimensional OSL with Amplitude/Phase Masks; 5.4 Three-Dimensional Optical Soft Lithography; 5.4.1 Optics; 5.4.2 Patterning Results; 5.5 Applications; 5.5.1 Low-Voltage Organic Electronics; 5.5.2 Filters and Mixers for Microfluidics; 5.5.3 High Energy Fusion Targets and Media for Chemical Release; 5.5.4 Photonic Bandgap Materials; References; 6 PATTERNING BASED ON EXTERNAL FORCE: NANOIMPRINT LITHOGRAPHY; 6.1 Introduction; 6.2 NIL MOLD |
6.2.1 Mold Fabrication6.2.2 Mold Surface Preparation; 6.2.3 Flexible Fluoropolymer Mold; 6.3 NIL Resist; 6.3.1 Thermoplastic Resist; 6.3.2 Copolymer Thermoplastic Resists; 6.3.3 Thermal-Curable Resists; 6.3.4 UV-Curable Resist; 6.3.5 Other Imprintable Materials; 6.4 The Nanoimprint Process; 6.4.1 Cavity Fill Process; 6.5 Variations of NIL Processes; 6.5.1 Reverse Nanoimprint; 6.5.2 Combined Nanoimprint and Photolithography; 6.5.3 Roll-to-Roll Nanoimprint Lithography (R2RNIL); 6.6 Conclusion; References; 7 PATTERNING BASED ON EDGE EFFECTS: EDGE LITHOGRAPHY; 7.1 Introduction |
7.2 Topography-Directed Pattern Transfer7.2.1 Photolithography with Phase-Shifting Masks; 7.2.2 Use of Edge-Defined Defects in SAMs; 7.2.3 Controlled Undercutting; 7.2.4 Edge-Spreading Lithography; 7.2.5 Edge Transfer Lithography; 7.2.6 Step-Edge Decoration; 7.3 Exposure of Nanoscale Edges; 7.3.1 Fracturing of Thin Films; 7.3.2 Sectioning of Encapsulated Thin Films; 7.3.3 Thin Metallic Films along Sidewalls of Patterned Stamps; 7.3.4 Topographic Reorientation; 7.4 Conclusion and Outlook; References; 8 PATTERNING WITH ELECTROLYTE: SOLID-STATE SUPERIONIC STAMPING; 8.1 Introduction |
8.2 Solid-State Superionic Stamping |
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Sommario/riassunto |
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Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics. |
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2. |
Record Nr. |
UNINA9911007351903321 |
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Titolo |
Engineering Psychology and Cognitive Ergonomics : 22nd International Conference, EPCE 2025, Held as Part of the 27th HCI International Conference, HCII 2025, Gothenburg, Sweden, June 22–27, 2025, Proceedings, Part I / / edited by Don Harris, Wen-Chin Li |
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Pubbl/distr/stampa |
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Cham : , : Springer Nature Switzerland : , : Imprint : Springer, , 2025 |
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ISBN |
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Edizione |
[1st ed. 2025.] |
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Descrizione fisica |
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1 online resource (XXVI, 371 p. 121 illus., 101 illus. in color.) |
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Collana |
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Lecture Notes in Artificial Intelligence, , 2945-9141 ; ; 15776 |
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Disciplina |
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Soggetti |
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Coding theory |
Information theory |
Computer networks |
Computers, Special purpose |
Computer systems |
User interfaces (Computer systems) |
Human-computer interaction |
Artificial intelligence |
Coding and Information Theory |
Computer Communication Networks |
Special Purpose and Application-Based Systems |
Computer System Implementation |
User Interfaces and Human Computer Interaction |
Artificial Intelligence |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Sommario/riassunto |
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This two-volume set constitutes the thoroughly refereed proceedings of the 22nd International Conference on Engineering Psychology and Cognitive Ergonomics, EPCE 2025, held as part of HCI International 2025, held in Gothenburg, Sweden, during June 22–27, 2025. Two volumes of the HCII 2025 proceedings are dedicated to this year’s |
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edition of the EPCE conference. The first volume centers around a diverse array of interconnected themes related to human performance, workload and situational awareness in the use of complex interactive applications and environments, as well as the role of cognitive psychology on designing and evaluating interactive systems and investigating computer-supported as in collaboration and teaming. The second volume focuses on issues related to Cognitive Psychology in the demanding contexts of aviation and space. |
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