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1. |
Record Nr. |
UNINA9910826083403321 |
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Titolo |
Nature and nurture in early child development / / edited by Daniel P. Keating [[electronic resource]] |
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Pubbl/distr/stampa |
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Cambridge : , : Cambridge University Press, , 2011 |
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ISBN |
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1-107-21824-1 |
1-139-01227-4 |
1-283-01726-1 |
9786613017260 |
1-139-00958-3 |
1-139-01011-5 |
1-139-00796-3 |
1-139-00685-1 |
0-511-97539-2 |
1-139-00906-0 |
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Descrizione fisica |
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1 online resource (xv, 295 pages) : digital, PDF file(s) |
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Disciplina |
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Soggetti |
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Nature and nurture |
Genetic psychology |
Child psychology |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Title from publisher's bibliographic system (viewed on 05 Oct 2015). |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Biological and experiential influences on psychological development / Michael Rutter -- Neural development and lifelong plasticity / Charles A. Nelson III -- Mother and child: preparing for a life / Ronald G. Barr -- Early experience and stress regulation in human development / Megan R. Gunnar and Michelle M. Loman -- Biology and context: symphonic causation and the distribution of childhood morbidities / W. Thomas Boyce -- Understanding within-family variability in children's responses to environmental stress / Jennifer Jenkins and Rossana Bisceglia -- Origins, development, and prevention of aggressive behavior / Richard E. Tremblay -- Mental health intervention in infancy and early childhood / Alicia F. Lieberman and Chandra Ghosh Ippen -- |
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Bridging a population health perspective to early biodevelopment: an emerging approach / Clyde Hertzman -- Society and early child development: developmental health disparities in the nature-and-nurture paradigm / Daniel P. Keating. |
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Sommario/riassunto |
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For developmental scientists, the nature versus nurture debate has been settled for some time. Neither nature nor nurture alone provides the answer. It is nature and nurture in concert that shape developmental pathways and outcomes, from health to behavior to competence. This insight has moved far beyond the assertion that both nature and nurture matter, progressing into the fascinating terrain of how they interact over the course of development. In this volume, students, practitioners, policy analysts, and others with a serious interest in human development will learn what is transpiring in this new paradigm from the developmental scientists working at the cutting edge, from neural mechanisms to population studies, and from basic laboratory science to clinical and community interventions. Early childhood development is the critical focus of this volume, because many of the important nature-nurture interactions occur then, with significant influences on lifelong developmental trajectories. |
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2. |
Record Nr. |
UNINA9910962985503321 |
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Autore |
Suzuki Kunihiro |
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Titolo |
Ion implantation and activation . Volume 3 / / Kunihiro Suzuki |
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Pubbl/distr/stampa |
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Sharjah : , : Bentham Science Publishers, , 2013 |
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ISBN |
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Edizione |
[1st ed.] |
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Descrizione fisica |
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1 online resource (212 p.) |
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Collana |
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Ion Implantation and Activation |
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Disciplina |
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Soggetti |
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Ion implantation |
Ion accelerators |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Cover; Title; EUL; Contents; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Index |
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Sommario/riassunto |
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Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories.Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling. |
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